2020 IEEE 70th Electronic Components and Technology Conference (ECTC) 2020
DOI: 10.1109/ectc32862.2020.00100
|View full text |Cite
|
Sign up to set email alerts
|

High Frequency Characteristics of Glass Interposer

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
4
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
4
3

Relationship

0
7

Authors

Journals

citations
Cited by 18 publications
(4 citation statements)
references
References 3 publications
0
4
0
Order By: Relevance
“…A resin film can be laminated as an insulation layer in the TGVs [85]. Partial filling technology can be compared to full filling technology in terms of electrical performance [86], and the electroplating time and costs are optimized to some extent. ALD demonstrates superior microporous filling performance compared to PVD and can be effectively utilized in the TSV process to deposit the insulation, barrier, and seed layers.…”
Section: Electroplating Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…A resin film can be laminated as an insulation layer in the TGVs [85]. Partial filling technology can be compared to full filling technology in terms of electrical performance [86], and the electroplating time and costs are optimized to some extent. ALD demonstrates superior microporous filling performance compared to PVD and can be effectively utilized in the TSV process to deposit the insulation, barrier, and seed layers.…”
Section: Electroplating Methodsmentioning
confidence: 99%
“…A resin film can be laminated as an insulation layer in the TGVs [ 85 ]. Partial filling technology can be compared to full filling technology in terms of electrical performance [ 86 ], and the electroplating time and costs are optimized to some extent.…”
Section: Through Glass Vias’ Formation and Metallization Techniquesmentioning
confidence: 99%
“…Fused silica, a material prized for its superior optical transparency, thermal stability, and notably low dielectric constant, is extensively utilized across a broad range of high-tech industries including optic, [1,2] semiconductor, [3] and high-frequency communications. [4,5] The increased demand for advanced and precise manufacturing technologies to process fused silica has led to the development and refinement of several specialized techniques including lithography and etching, [6][7][8] nano-imprint, [9,10] and ultrafast laser processing. [11][12][13] Through glass vias (TGVs) are pivotal in creating vertical connections on glass substrates, predominantly utilized in integrated circuits and microelectronic devices fabrication.…”
Section: Introductionmentioning
confidence: 99%
“…The fan-out package structure has good electrical and thermal performance and is used in many applications for system integration. Moreover, packaging-on-packaging (PoP) technology allows packages to be stacked three-dimensionally, thus achieving high-density integration and improving chip-to-chip performance (e.g., in applications with high-frequency data exchange between application processes and memory) [ 1 , 2 , 3 ].…”
Section: Introductionmentioning
confidence: 99%