High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing

Kogelschatz, U.; Esrom, Hilmar; Zhang, J.-Y; Boyd, Ian W.

doi:10.1016/s0169-4332(00)00571-7

Cited by 107 publications

(51 citation statements)

References 65 publications

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“…Recently some emerging scientific investigations were performed in neon [Carman R J et al 2010]. Rare gas DBDs can be used for excilamps Boyd I W 2000, Boichenko A M et al 2004], mercury-free lamps [Jinno et al 2005], for oxidation of silicon at 250 °C [Kogelschatz U et al 2000]. Operating in xenon or neon, they produce VUV or EUV (10 nm < λ < 100 nm) emissions with an efficiency as high as 50 to 60% [Vollkommer F and Hitzschke L 1996, Hitzschke L and Vollkommer F 2001, Mildren R P and Carman R J 2001, Carman R J and Mildren R P 2003, Carman R J et al 2004, Merbahi N et al 2007, Carman R J et al 2010.…”

Section: Introductionmentioning

confidence: 99%

Electric and spectroscopic analysis of a pure nitrogen mono-filamentary dielectric barrier discharge (MF-DBD) at 760 Torr

Sewraj¹,

Merbahi²,

Gardou³

et al. 2011

J. Phys. D: Appl. Phys.

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To cite this version:N Sewraj, N Merbahi, J P Gardou, P Rodriguez Akerreta, F Marchal. Electric and spectroscopic analysis of a pure nitrogen mono-filamentary dielectric barrier discharge (MF-DBD) at 760Torr. Journal of Physics D: Applied Physics, IOP Publishing, 2011, 44 (14) AbstractAs far as we know, VUV emissions of nitrogen MF-DBDs have never been reported before.Mono-filamentary dielectric barrier discharge (MF-DBD), occurring within 1-mm gap of atmospheric pressure pure nitrogen and operating with a sinusoidal electric supply at about 8 kHz, is studied in this paper.A thorough electrical analysis allows experimental determination of the ignition and extinction voltages,respectively (

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Section: Introductionmentioning

confidence: 99%

Electric and spectroscopic analysis of a pure nitrogen mono-filamentary dielectric barrier discharge (MF-DBD) at 760 Torr

Sewraj¹,

Merbahi²,

Gardou³

et al. 2011

J. Phys. D: Appl. Phys.

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“…The extent of this polymer chain rearrangement and etching gives rise to the observed range of surface topographies (i.e. by varying parameters such as plasma power and exposure time during plasma processing) [18,20,48]. Also, VUV irradiation penetrates below the polymer film surface [49] to cause dissociation of polymer chain σ-bonds [50], and facilitating cross-linking of the subsurface through reaction with unsaturated polybutadiene carbon-carbon double bonds to create regions more resilient towards ablation (surface roughness) [51].…”

Section: Afm Surface Topographymentioning

confidence: 99%

Topographical length scales of hierarchical superhydrophobic surfaces

Dhillon

Brown

Bain

et al. 2014

Applied Surface Science

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The full-text may be used and/or reproduced, and given to third parties in any format or medium, without prior permission or charge, for personal research or study, educational, or not-for-prot purposes provided that:• a full bibliographic reference is made to the original source • a link is made to the metadata record in DRO • the full-text is not changed in any way The full-text must not be sold in any format or medium without the formal permission of the copyright holders.Please consult the full DRO policy for further details. ABSTRACTThe morphology of hydrophobic CF 4 plasma fluorinated polybutadiene surfaces has been characterised using atomic force microscopy (AFM). Judicious choice of the plasma power and exposure duration leads to formation of three different surface morphologies (Micro, Nano, and Micro+Nano). Scaling theory analysis shows that for all three surface topographies, there is an initial increase in roughness with length scale followed by a levelling-off to a saturation level. At length scales around 500 nm, it is found that the roughness is very similar for all three types of surfaces, and the saturation roughness value for the Micro+Nano morphology is found to be intermediate between those for the Micro and Nano surfaces. Fast Fourier Transform (FFT) analysis has shown that the Micro+Nano topography comprises a hierarchical superposition of Micro and Nano morphologies. Furthermore, the Micro+Nano surfaces display the highest local roughness (roughness exponent α = 0.42 for length scales shorter than ~ 500 nm), which helps to explain their superhydrophobic behaviour (large water contact angle (> 170°) and low hysteresis (< 1°)).

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“…The lamps developed later from water-free quartz [76] were much more transparent. Excimer lamps used for photoetching and microstructuring of the polymer surface have been developed for applications in standard MW ovens [62].…”

Section: Other Applicationsmentioning

confidence: 99%

Microwaves in Photochemistry and Photocatalysis

Cı́rkva

2012

Microwaves in Organic Synthesis

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High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing

Cited by 107 publications

References 65 publications

Electric and spectroscopic analysis of a pure nitrogen mono-filamentary dielectric barrier discharge (MF-DBD) at 760 Torr

Electric and spectroscopic analysis of a pure nitrogen mono-filamentary dielectric barrier discharge (MF-DBD) at 760 Torr

Topographical length scales of hierarchical superhydrophobic surfaces

Microwaves in Photochemistry and Photocatalysis

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