High-intensity x-ray microbeam for macromolecular crystallography using silicon kinoform diffractive lenses

Lebugle, Maxime; Dworkowski, Florian; Pauluhn, A.; Guzenko, Vitaliy A.; Romano, Lucia; Meier, Nathalie; Marschall, Felix; Sánchez, Darío Ferreira; Grolimund, Daniel; Wang, Meitian; Dávid, Christian

doi:10.1364/ao.57.009032

Cited by 8 publications

(13 citation statements)

References 32 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The applicability of such optics spans from medical applications, such as breast phase contrast imaging 23 and dark-field lung imaging 24 with potentially improved diagnostic power, to high end imaging at the nanoscale with highly brilliant light sources. 25,26 Results and discussion…”

mentioning

confidence: 99%

Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

et al. 2020

Self Cite

View full text Add to dashboard Cite

show abstract

mentioning

confidence: 99%

Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

et al. 2020

Self Cite

View full text Add to dashboard Cite

show abstract

“…The publications addressing the use of MacEtch for specific X-ray optics fabrication is 13 with the first reports in 2014. [2,8,15,17,18,21,[24][25][26]31,32,[35][36][37][38][39][40][41]43,47,50,51,54,[56][57][58]62,63,71,73,77,78,93, and specific for X-ray optics fabrication [17,18,21,[35][36][37][38][39][40][41]93,119,126,153]. X-ray optics with nanostructured features, such as kinoform lenses and Fresnel zone plates, showed to benefit from MacEtch fabrication.…”

Section: Discussionmentioning

confidence: 99%

Section: Vertical Etchingmentioning

confidence: 99%

“…Electron-hole concentration balancing structures were used to achieve a vertical etch profile in X-ray zone plates [17]. Figure 3 shows some examples of balancing structures [36] used to define the vertical etching at the borders of the X-ray lens structures [41]. Negative carbon mask [54,55], electrical bias [32,55], and magnetic catalyst [56] have been proposed to force the vertical etching and to improve the control of the catalyst movement [47,52,57].…”

Section: Concentration H O Hfmentioning

confidence: 99%

“…Since its discovery in 2000, by Li et al [13], MacEtch of silicon has emerged as a new technique capable of fabricating 3D nano-and micro-structures of several shapes and applications [23]:-nano-porous film, nanowires [24], 3D objects [25], trenches, vias [26], micro-fins [27], nano-scale grooves, surface antireflection texturing [28], optoelectronic devices such as solar cells [29] and photodetectors [30], sensor devices [31], X-ray optics-in a few semiconductors substrates: Si [15], Ge [30], poly-Si [32], GaAs [33], β-Ga 2 O 3 [27], SiC [34], etc.-and different catalysts: Ag, Au, Cu, Pt, and Pd [15]. MacEtch has been developed with a strong controlled vertical directionality with respect to the substrate and successfully applied for producing X-ray zone plates [17,23,[35][36][37][38] and diffraction gratings [19,20,37,[39][40][41]. In MacEtch, a catalyst layer (e.g., Au) is patterned onto the substrate (e.g., Si) to locally increase the dissolution rate of the substrate material in an etchant solution including a fluoride etchant such as hydrofluoric acid (HF) and an oxidizing agent such as hydrogen peroxide (H 2 O 2 ).…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review

Romano

Stampanoni

2020

Micromachines

Self Cite

View full text Add to dashboard Cite

High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X-ray optics. Microfabrication is usually achieved by dry-etch with reactive ions and KOH based wet-etch, metal assisted chemical etching (MacEtch) is emerging as a new etching technique that allows huge aspect ratio for feature size in the nanoscale. To date, a specialized review of MacEtch that considers both the fundamentals and X-ray optics applications is missing in the literature. This review aims to provide a comprehensive summary including: (i) fundamental mechanism; (ii) basics and roles to perform uniform etching in direction perpendicular to the <100> Si substrate; (iii) several examples of X-ray optics fabricated by MacEtch such as line gratings, circular gratings array, Fresnel zone plates, and other X-ray lenses; (iv) materials and methods for a full fabrication of absorbing gratings and the application in X-ray grating based interferometry; and (v) future perspectives of X-ray optics fabrication. The review provides researchers and engineers with an extensive and updated understanding of the principles and applications of MacEtch as a new technology for X-ray optics fabrication.

show abstract

Low Cost and High‐Aspect Ratio Micro/Nano Device Fabrication by Using Innovative Metal‐Assisted Chemical Etching Method

et al. 2019

View full text Add to dashboard Cite

In this paper, the metal‐assisted chemical etching (MACE) method is presented along with the advantages of using this method. Large areas and a combination of large and narrow patterning areas are successfully produced by using metal meshes for MACE. Moreover, in order to exemplify this microfabrication technique, the authors demonstrate the fabrications of different microelectromechanical systems (MEMS) devices; from simple structure (micro‐cantilever) to a complex structure (capacitive silicon resonator). Micro‐cantilever beam with resonant frequency of 262 kHz and quality factor of 8100 is successfully fabricated using this technique. Narrow capacitive gap width together with silicon resonator structure is also microprocessed by MACE technique. For the capacitive resonator, nano gaps with 250 nm‐width and 7 μm‐height is successfully micro‐fabricated using MACE process on a silicon on insulator (SOI) wafer. The resonant peak of the fabricated device is found at 81.4 MHz with quality factor of 4000 and motional resistance of 89 kΩ. The MACE process is performed in the wet etching solution that enables the fabrication of anisotropic silicon structures. This paper demonstrates that MACE method could potentially replace dry etching technique currently used for the fabrication of various electronics and photonics devices and energy applications. Due to the ease of implementation and possibility of batch fabrication, MACE method is a promising technique for the manufacturing of a broad range of high‐quality Si‐based devices at low cost.

show abstract

High-intensity x-ray microbeam for macromolecular crystallography using silicon kinoform diffractive lenses

Cited by 8 publications

References 32 publications

Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review

Low Cost and High‐Aspect Ratio Micro/Nano Device Fabrication by Using Innovative Metal‐Assisted Chemical Etching Method

Contact Info

Product

Resources

About