A nonvolatile flash memory device has been fabricated using carbon nanotubes ͑CNTs͒ as a floating gate embedded in HfAlO ͑the atomic ratio of Hf/ Al is 1:2͒ high-k tunneling/control oxides and its memory effect has been observed. Capacitance-voltage ͑C-V͒ measurements illustrated a 400 mV memory window during the double C-V sweep from 3 to −3 V performed at room temperature and 1 MHz. Further studies on their programming characteristics revealed that electron is difficult to be written into the CNTs and the memory effect of the structures is mainly due to the holes traps. The memory window width can remain nearly unchanged even after 10 4 s stressing, indicating excellent long term charge retention characteristics. We therefore suggest that the CNTs embedded in HfAlO can be potentially applied to floating gate flash memory devices. © 2006 American Institute of Physics. ͓DOI: 10.1063/1.2179374͔Since their discovery in the early 1990s, 1 carbon nanotubes ͑CNTs͒ have attracted much attention, both of scientific and technological interest, for possible nanoelectronic applications. To date, a number of nanoelectronic devices have been realized with CNTs, such as field effect transistors, 2-4 room-temperature single-electron transistors, 5 logic gate circuits, 6 inverters, 7 and electromechanical switches. 8 Very recently, the prototypes of memory devices based on CNT field effect transistors were also reported, 9-12 demonstrating another significant extension of CNTs applications. From then on, several groups have carried out research on the CNT-based memories. [13][14][15][16][17] In these research works, the CNTs were synthesized on a conductive Si substrate capped by several hundred nanometers of SiO 2 . Metal electrodes were evaporated on the CNTs to form source and drain electrical contact to them. The conductive Si substrate actually acts as the gate of the memory device. The function of the CNTs was the current channel, and the memory effect of the devices was attributed to the charges injected from the CNTs to the defects or charge traps in the dielectrics or the interface between the CNTs and the oxides. 15-17 The CNTs were not used as the charge storage nodes.For commonly studied flash memory devices, Si, 18 Ge, 19 and Si 1−x Ge x ͑Ref. 20͒ nanocrystals are widely used as the charge storage nodes and the memory structures are sandwiched with nanocrystals embedded in the SiO 2 or high-k dielectrics. But up to now, there is no report on flash memory devices using CNTs as a floating gate. In terms of electrical properties, CNTs have many unique advantages for the application in memory devices such as tunable band gap, high thermal stability and chemical inertness, perfect sidewall structure, and nearly zero surface states. 21,22 These unique properties are very favorable for their application as the charge storage nodes in the memory devices. In this letter, we report the fabrication of the HfAlO/ CNTs/ HfAlO/ Si memory structures and characterization of the unique memory characteristics of CNTs using as the c...