Monolithic integration of microscale organic field-effect transistors (micro-OFETs) is the only and inevitable path toward low-cost large-area electronics and displays. However, to date, such an ultimate technology has not yet evolved due to challenges in positioning and patterning highly crystalline microscale molecular layers as well as in developing micrometer scale integration schemes. In this work, by mastering the local growth of molecular semiconductors on pre-defined terraces, single-crystal quasi-2D molecular layers tens of square micrometers in size are created in dense periodic arrays on a Si substrate. Nondestructive photolithographic processes are developed to pattern micro-OFETs with mobilities up to 34.6 cm 2 V −1 s −1 . This work demonstrates the feasibility to integrate arrays of short-channel micro-OFETs into electronic circuitry by highly parallel and size scalable fabrication technologies.