2016
DOI: 10.1039/c6tc00580b
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High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition

Abstract: A thin-film transistor with a 5 nm-thick indium oxide active layer deposited by plasma-enhanced atomic layer deposition (PEALD) showed outstanding performance even with a polycrystalline phase.

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Cited by 104 publications
(90 citation statements)
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“…The photoelectron peak for In 3d (Fig. 5) exhibits two peaks, corresponding to In 3d 5/2 and In 3d 3/2 [40]. Moreover, the S 2p peak splitting of 161.4 eV and 162.6 eV, a split energy with 1.2 eV, represents the S 2− in the nanocomposite sample [28].…”
Section: Resultsmentioning
confidence: 99%
“…The photoelectron peak for In 3d (Fig. 5) exhibits two peaks, corresponding to In 3d 5/2 and In 3d 3/2 [40]. Moreover, the S 2p peak splitting of 161.4 eV and 162.6 eV, a split energy with 1.2 eV, represents the S 2− in the nanocomposite sample [28].…”
Section: Resultsmentioning
confidence: 99%
“…The characteristic peaks of Sn 4+ 3d 5/2 and Sn 4+ 3d 3/2 (488.0 and 496.5 eV) were identically recorded in T‐ and P‐SnO 2 TFs without shift, and O 1s peaks were clearly observed at 531.4 eV, which roughly suggests that the pure SnO 2 TFs formed regardless of the annealing method. To better understand the difference in chemical bonding of the two films, the O 1s peaks were deconvolved from the two spectra, where the individual peaks at lower and higher binding energies were originated from the lattice oxygen atoms in a fully coordinated environment (MOM), and the hydroxide species (MOH), respectively . The peak for MOM backbones, serving as electron conductance pathways, was more prominent in P‐SnO 2 TF than T‐SnO 2 , TF and the peak corresponding to MOH, playing a role as shallow trap sites, was slightly weak in the P‐SnO 2 TF.…”
mentioning
confidence: 99%
“…As observed by the XPS, the film deposited at 100 °C has higher O-content and more O atoms may exist as oxygen interstitials or OH ligands. In addition, the possible-existing carbon content that has been reported to decrease with increasing substrate temperature may have influence on the refractive index [ 14 , 18 ]. A sharp decrease in refractive index at 150–200 °C was observed, which should be ascribed to the amorphous-to-crystalline transition.…”
Section: Resultsmentioning
confidence: 99%
“…In addition, utilizing stronger oxidants, such as ozone (O 3 ) and O 2 plasma is a feasible approach to enhance the reaction of precursors, hence significantly increasing the growth rate of ALD-In 2 O 3 film [ 13 , 16 ]. Recently, In 2 O 3 film has been successfully prepared by ALD with the assistance of O 2 plasma [ 16 , 17 , 18 ]. In these studies, the influence of deposition temperature in the range of 70–400 °C on the In 2 O 3 film properties and the performance of the TFT device have been investigated, in the aim of capturing the ALD window and achieving suitable or optimal characteristics for device application.…”
Section: Introductionmentioning
confidence: 99%