2023
DOI: 10.1016/j.optlaseng.2022.107347
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High optical storage density using three-dimensional hybrid nanostructures based on machine learning

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Cited by 5 publications
(4 citation statements)
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“…The manufacturing noise and measurement noise vary according to the actual measurement equipment and environment. According to the research of D. Yang et al [ 16 ], it is reasonable to set the manufacturing noise and measurement noise at 10%, respectively. Figure 8 a shows the cross-entropy loss corresponding to the 12, 18, and 120 data sets at different polarizations.…”
Section: Analysis and Evaluation Of Readout Informationmentioning
confidence: 99%
See 1 more Smart Citation
“…The manufacturing noise and measurement noise vary according to the actual measurement equipment and environment. According to the research of D. Yang et al [ 16 ], it is reasonable to set the manufacturing noise and measurement noise at 10%, respectively. Figure 8 a shows the cross-entropy loss corresponding to the 12, 18, and 120 data sets at different polarizations.…”
Section: Analysis and Evaluation Of Readout Informationmentioning
confidence: 99%
“…Polarization modulation and readout scheme-dependent (DNA-based) signals require precise patterning and complex readout schemes. Volume product-dependent (holographic memory) is difficult to obtain for full product industrialization solutions [ 16 ]. Hence, more research into developing new storage methods has been carried out.…”
Section: Introductionmentioning
confidence: 99%
“…1 It has been demonstrated that artificial neural networks can be trained for accurate and robust information readout from the optical response of different 2D and 3D geometries of dielectric nanostructures. 1,6,7 Color encoding has the potential to enable fast, parallel and precise data extraction from a single measurement over a large area with many nanostructures; possibly enabling future industrialization of such technologies. However, a major challenge is to increase the number of digital bits of information that can be encoded in a single nanostructure, while remaining capable to retrieve this information from a fast color measurement.…”
Section: Introductionmentioning
confidence: 99%
“…With the rapid advancement in lithography techniques, the demand for precise control of feature size and spatial morphology for nanopatterning is eminent. [1][2][3][4][5] This is principally because the performance characteristics of nanodevices are highly sensitive to the critical dimensions of nanostructures. Consequently, it is essential to achieve arbitrary modulation of nanoscale feature size with high delity in the lithographic process.…”
Section: Introductionmentioning
confidence: 99%