“…Various methods have been used for the deposition of the thin films of metal oxides, including Chemical Vapor Deposition, Pulsed Laser Deposition, Sputtering, Hydrothermal Synthesis, Atomic Layer Deposition, Electrodeposition, Anodization techniques, and Sol‐Gel . More recently, a new deposition approach has been reported, the Spark Method, which is very attractive because it is a low cost and simple physical method, without the need of dangerous chemical precursors that can be easily used for large scale manufacturing.…”