based on silicon, these novel materials or architectures have the advantage of ultrahigh sensitivity, a large memory window, or a multi-level function. Unfortunately, these materials still remain in the research stage and require further work with fabrication or an improvement in fundamental knowledge for adoption in back/front end of line (B/FEOL) processes before commercialization can be achieved. Most of these memory devices are still not compatible with microelectronic device systems or practical applications due to high operating voltages, low storage capacity, or a material that has not yet been significantly characterized for commercialization. Therefore, a suitable solution for commercialization in optical communications is still a pressing concern. Amorphous indium-gallium-zinc-oxidethin-film transistors (a-InGaZnO TFTs) have been leading the display industry to new levels after the first demonstration from Hosono et al. in 2004. [18] Due to their outstanding electrical properties, ultra-low leakage current (≈10 −20 A), and an ideal carrier mobility (≈10 cm 2 V −1 s −1), InGaZnO-based displays are capable of delivering high resolution and low power consumption products. [19-23] Also, fabrication advantages, including room temperature deposition and massive area uniformity, have drawn interest for use in large-format and portable-flexible electronic displays. Apart from display products, InGaZnO-based Optoelectronic memory whose digital signals depend on electrical as well as optical sources have attracted tremendous attention recently due to their potential in applications, including optical communication systems, neural networks, and image correlation systems. In this work, metal-oxide semiconductors for use as optical memory devices are accomplished through a heterojunction channel layer which acts as a quantum confinement architecture confining electrons to the front channel. Compared to conventional memories, which rely on electron injections that cause hot electron degradation, the proposed device is based on a floating body effect. After irradiation, photo-excited carriers are separated under a lateral electrical field, and generated holes are left in the back channel, which facilitates data storage behavior. Beneficial characteristics include a memory window (≈4.6 V), a high on/off ratio (≈10 6), and low operating voltage (<20 V). Furthermore, photo-excited carriers are only generated when irradiated by ultraviolet light, leading to a visible-blind optical memory. A retention of more than 10 years and endurance cycle of more than 1000 cycles demonstrate its nonvolatile behaviors. This work provides a novel heterojunction channel layer architecture in disordered oxide semiconductors and provides a novel idea for a wide range of unipolar materials in future optoelectronic memory devices.