High performance La/B<sub>4</sub>C multilayer mirrors with barrier layers for the next generation lithography

Чхало, Н. И.; Künstner, Silvio; Полковников, В. Н.; Салащенко, Н. Н.; Schäfers, F.; Starikov, S. A.

doi:10.1063/1.4774298

Cited by 71 publications

(57 citation statements)

References 10 publications

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“…17 Application of the barriers succeeded in reducing the depth of mixing of the film materials. From analysis of the angular and spectral dependence of the reflection coefficients, the following values were obtained: σ 1 = 0.6 nm and σ 2 = 0.25 nm.…”

Section: Issues Of Multilayer La/b Optics For Beuv At 67 Nmmentioning

confidence: 99%

Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics

Чхало

Салащенко

2013

AIP Advances

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A prospective move to 10.5 and 11.2 nm wavelengths, as an alternative to 6.7 and 13.5 nm, for next generation nanolithography is discussed. Ten-mirror optical systems based on Ru/Be, Mo/Be, Rh/Sr, Mo/Si, and La/B multilayers were compared for efficiency at their working wavelengths. It is shown that a transition to 10.5 nm and 11.2 nm may be a solution to the problem of increasing performance and resolution of a projection system

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Section: Issues Of Multilayer La/b Optics For Beuv At 67 Nmmentioning

confidence: 99%

Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics

Чхало

Салащенко

2013

AIP Advances

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“…4 At shorter wavelengths, La/B 4 C multilayer was reported to have a reflectivity of 58.7 % at 6.7 nm with the bandwidth as narrow as 0.6 %. 8 The peak wavelength of reflection can be changed slightly by changing spacing of multilayers but the bandwidth cannot be increased when a high reflectivity is required. Therefore, for using La/B 4 C multilayers, we need an LPP emitting at around 6.7 nm having a narrow bandwidth.…”

Section: -2mentioning

confidence: 99%

Sharpening of the 6.8 nm peak in an Nd:YAG laser produced Gd plasma by using a pre-formed plasma

et al. 2016

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For effective use of a laser-produced-plasma (LPP) light source, an LPP is desired to emit a narrow spectral peak because the reflection spectrum of multilayer mirrors for guiding emission from the source is very narrow. While a Gd plasma has been studied extensively as an extreme ultraviolet (EUV) light source at around 6.8 nm, where La/B4C multilayer is reported to have a high reflectivity with a bandwidth of about 0.6 %, all previous works using an Nd:YAG laser reported very broad spectra. This paper reports the first narrowing of the 6.8 nm peak in the case of using an Nd:YAG laser to generate a Gd plasma by using a pre-pulse. The best peak narrowing is observed when a pre-formed plasma is heated by a 1064 nm main laser pulse with a duration of 10 ns at the irradiation density of 4x 1011 W/cm2 at a delay time of 50 ns after the pre-pulse irradiation. The observed spectral width of about 0.3 nm is about one fifth of the value for no pre-formed plasma. The peak wavelength of the 6.8 nm band shifted to a longer wavelength side and the peak was broadened both for lower and higher laser irradiation density. It is discussed that this robustness of the peak position of the 6.8 nm Gd peak against temperature change is suitable to achieve a narrow bandwidth from an LPP generated on solid. The observed spectra are compared with those previously reported in various conditions.

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“…Currently at BESSY-II two experimental stations, a small reflectometer (Schä fers & Cimino, 2013) and a polarimeter (Schä fers et al, 1999), are in operation, which have been used for many years for at-wavelength reflectometry (Schä fers et al, 1998;Chkhalo et al, 2013), polarimetry (MacDonald et al, 2009;Gaupp et al, 2013) and ellipsometry measurements.…”

Section: Issn 1600-5775mentioning

confidence: 99%

The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II

et al. 2016

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A technology center for the production of high-precision reflection gratings has been established. Within this project a new optics beamline and a versatile reflectometer for at-wavelength characterization of UV-and XUV-reflection gratings and other (nano-) optical elements has been set up at BESSY-II. The Plane Grating Monochromator beamline operated in collimated light (c-PGM) is equipped with an SX700 monochromator, of which the blazed gratings (600 and 1200 lines mm À1 ) have been recently exchanged for new ones of improved performance produced in-house. Over the operating range from 10 to 2000 eV this beamline has very high spectral purity achieved by (i) a four-mirror arrangement of different coatings which can be inserted into the beam at different angles and (ii) by absorber filters for high-order suppression. Stray light and scattered radiation is removed efficiently by double sets of in situ exchangeable apertures and slits. By use of in-and off-plane bending-magnet radiation the beamline can be adjusted to either linear or elliptical polarization. One of the main features of a novel 11-axes reflectometer is the possibility to incorporate real life-sized gratings. The samples are adjustable within six degrees of freedom by a newly developed UHV-tripod system carrying a load up to 4 kg, and the reflectivity can be measured between 0 and 90 incidence angle for both s-and p-polarization geometry. This novel powerful metrology facility has gone into operation recently and is now open for external users. First results on optical performance and measurements on multilayer gratings will be presented here.

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High performance La/B₄C multilayer mirrors with barrier layers for the next generation lithography

Cited by 71 publications

References 10 publications

Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics

Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics

Sharpening of the 6.8 nm peak in an Nd:YAG laser produced Gd plasma by using a pre-formed plasma

The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II

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High performance La/B4C multilayer mirrors with barrier layers for the next generation lithography

Cited by 71 publications

References 10 publications

Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics

Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics

Sharpening of the 6.8 nm peak in an Nd:YAG laser produced Gd plasma by using a pre-formed plasma

The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II

Contact Info

Product

Resources

About

High performance La/B₄C multilayer mirrors with barrier layers for the next generation lithography