1997
DOI: 10.1016/s0013-4686(96)00320-9
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High performance proton exchange membrane fuel cells with sputter-deposited Pt layer electrodes

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Cited by 250 publications
(137 citation statements)
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“…Despite the ability to produce CLs as thin as 1 mm, the performance of MEA prepared using sputter-deposited CLs varies by several orders of magnitude primarily due to the variation in CL thickness and particle size (<10 nm). Sputtering thick CLs (>10 um) is disadvantageous because of the absence of ionomer inside the CL [30]. In such cases, impregnation of PTFE and carbon power into the porous substrate is crucial to enhance ionic transport.…”
Section: A Magnetron Sputteringmentioning
confidence: 99%
“…Despite the ability to produce CLs as thin as 1 mm, the performance of MEA prepared using sputter-deposited CLs varies by several orders of magnitude primarily due to the variation in CL thickness and particle size (<10 nm). Sputtering thick CLs (>10 um) is disadvantageous because of the absence of ionomer inside the CL [30]. In such cases, impregnation of PTFE and carbon power into the porous substrate is crucial to enhance ionic transport.…”
Section: A Magnetron Sputteringmentioning
confidence: 99%
“…Low Pt loading electrodes can be produced leading to achieve convenient fuel cell performance. Plasma sputtering has thus the advantage of controlling the depth profile and reducing the amount of catalyst by localizing the catalytic material as close as possible to the electrolyte membrane [67][68][69][70][71][72][73][74][75][76]. Platinum can be sputtered in many manners depending on the plasma sources.…”
Section: Ii2 New Preparation Methods Of Efficient Electrode Catalystsmentioning
confidence: 99%
“…Coupled Plasma (ICP) sputtering are the main ways to handle deposition of the required Pt nanoclusters [68][69][70][71][72][73][74][75], allowing preparing different kinds of platinum-based thin films. The control of the deposition parameters (target composition, chamber pressure, bias voltage applied between the targets and the substrate, energy of the plasma, distance between target and substrate, etc.)…”
Section: Ii2 New Preparation Methods Of Efficient Electrode Catalystsmentioning
confidence: 99%
“…It allows deposition of thin compact films upon a selected substrate material and ensures simplicity of the catalysts preparation as well as improved stability, durability, and utilisation. [7][8][9][10][11][12][13][14][15][16][17][18] The sputter conditions are easily controlled in obtaining homogeneous, well dispersed and reproducible thin films of various single and composite materials with a very low loading. Using this method an essential decrease in the fuel cell cathode Pt loadings without reduction in performance has been already achieved.…”
Section: Introductionmentioning
confidence: 99%
“…7,[11][12][13][14] It has been demonstrated that the sputter method insures very efficient usage and high mass activity of the platinum. [15][16][17] The technique was also applied for deposition of thin iridium oxide electyrocatalytic films as anode material for PEM water electrolysis and a 10 fold decrease of the catalyst loading has been reported compared to conventional iridium anodes. 18 On the other hand, how the sputter parameters effect the catalysts condition is still an enigma.…”
Section: Introductionmentioning
confidence: 99%