High-performance rectifiers fabricated on a flexible substrate

Etor, David; Dodd, Linzi E.; Wood, David; Balocco, Claudio

doi:10.1063/1.4967190

Cited by 12 publications

(5 citation statements)

References 24 publications

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“…Traditional micro- and nanofabrication techniques are designed to pattern on rigid substrates, such as silicon wafers. Patterning micro- and nanostructures on unconventional substrates, such as soft and flexible materials (e.g., polydimethylsiloxane (PDMS)) and curved substrates [ 11 , 12 ], emerged in recent years because of applications in wearable electronics [ 13 ], implantable medical devices [ 14 ], and disposable sensors [ 15 ]. Also, as the required resolution reaches down to a nanometer scale, traditional patterning techniques such as EBL are slow and expensive to pattern in a large area.…”

Section: Introductionmentioning

confidence: 99%

Stencil Lithography for Scalable Micro- and Nanomanufacturing

Ding

Liu

et al. 2017

Micromachines

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Abstract:In this paper, we review the current development of stencil lithography for scalable micro-and nanomanufacturing as a resistless and reusable patterning technique. We first introduce the motivation and advantages of stencil lithography for large-area micro-and nanopatterning. Then we review the progress of using rigid membranes such as SiNx and Si as stencil masks as well as stacking layers. We also review the current use of flexible membranes including a compliant SiNx membrane with springs, polyimide film, polydimethylsiloxane (PDMS) layer, and photoresist-based membranes as stencil lithography masks to address problems such as blurring and non-planar surface patterning. Moreover, we discuss the dynamic stencil lithography technique, which significantly improves the patterning throughput and speed by moving the stencil over the target substrate during deposition. Lastly, we discuss the future advancement of stencil lithography for a resistless, reusable, scalable, and programmable nanolithography method.

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Section: Introductionmentioning

confidence: 99%

Stencil Lithography for Scalable Micro- and Nanomanufacturing

Ding

Liu

et al. 2017

Micromachines

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“…etal-insulator-metal (MIM) and metal-insulator-insulator-metal (MIIM) tunnel diodes have attracted much attention from the perspective of devices having the potential to be used as a square-low detector for high-frequency rectifying systems, such as energy harvesting applications. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20] Important performance indexes for the harvesting application are the effective current responsivity (β eff ) under a high-frequency condition and the junction resistance (R D ) -area (A) products (R D A) at a zero-bias voltage. In general, low R D A is preferable for high-frequency applications because it leads to a shorter RC time constant, and thereby resulting in a higher cut-off frequency ( f c ) of the system.…”

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confidence: 99%

Theoretical study of rectifying properties in a terahertz regime with a zero-bias voltage for fully epitaxial Fe/ZnO/MgO/Fe magnetic tunnel junctions

Saito

Imamura

2019

Appl. Phys. Express

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We conducted a theoretical study of high-frequency rectifying properties with a zero-bias voltage in epitaxial Fe(001)/ZnO(001)/MgO(001)/Fe(001) magnetic tunnel junctions (MTJs) in conjunction with the expectation of the element being applied as a square-low detector. By optimizing device parameters such as insulator thickness and the junction area, we obtained current responsivity of up to 0.12 A W−1 at 1 THz (with a cut-off frequency of 1.5 THz), which is comparable to the best results obtained in experiments for semiconductor-based diodes, performed under similar conditions. The results indicate that this MTJ system has great potential for use as a high-frequency rectifying element in a terahertz regime.

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“…This leads to the shorter RC time constant, and thereby resulting in higher cut-off frequency of the system, compared to the semiconductor-based diodes. Moreover, the MIM diode is suitable for mass-production due to its feasibility of employing conventional manufacturing growth methods, such as a sputtering, even on a flexible substrate 15) at low temperatures.…”

Section: Introductionmentioning

confidence: 99%

Estimation of Rectifying Performance for Terahertz Wave in Newly Designed Fe/ZnO/MgO/Fe Magnetic Tunnel Junction

Saito

Imamura

2020

J. Magn. Soc. Jpn.

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We fabricated fully epitaxial Fe/ZnO/MgO/Fe magnetic tunnel junctions (MTJs) with low junction resistance-area products (several m 2 ) and conducted a theoretical estimation of square-low rectifying performance for a terahertz electromagnetic wave. Effective current responsivity up to 0.09 A/W at 1 THz was obtained under zero-bias voltage condition at room temperature. The result is approximately half the value of the best result obtained for experiments in semiconductor-based diodes, performed under similar conditions. The study strongly suggests that this MTJ system has a great potential for the rectifying element of the terahertz wave.

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High-performance rectifiers fabricated on a flexible substrate

Cited by 12 publications

References 24 publications

Stencil Lithography for Scalable Micro- and Nanomanufacturing

Stencil Lithography for Scalable Micro- and Nanomanufacturing

Theoretical study of rectifying properties in a terahertz regime with a zero-bias voltage for fully epitaxial Fe/ZnO/MgO/Fe magnetic tunnel junctions

Estimation of Rectifying Performance for Terahertz Wave in Newly Designed Fe/ZnO/MgO/Fe Magnetic Tunnel Junction

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