2022
DOI: 10.1039/d1ra08718e
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High-performance ReS2 photodetectors enhanced by a ferroelectric field and strain field

Abstract: The flexible ReS2/P(VDF-TrFE) hybrid photodetector could be enhanced by a ferroelectric field and strain field.

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Cited by 13 publications
(9 citation statements)
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“…PL spectrum of the ReS 2 nanobelt shows a broad emission peak locates at about 1.5 eV (Figure 1e), consistent with previous report. [ 31 ] Owing to the anisotropic crystal structure, ReS 2 exhibits multiple scattering peak in Raman spectrum. As shown in Figure 1f, there are two low frequencies Ag‐like modes locating at 136.8 and 144.5 cm −1 corresponding to the out‐of‐plane vibrations of Re atoms and four Eg‐like modes locating at 153.6, 163.4, 218.2, and 238.1 cm −1 corresponding to the in‐plane vibrations of Re atoms.…”
Section: Resultsmentioning
confidence: 99%
“…PL spectrum of the ReS 2 nanobelt shows a broad emission peak locates at about 1.5 eV (Figure 1e), consistent with previous report. [ 31 ] Owing to the anisotropic crystal structure, ReS 2 exhibits multiple scattering peak in Raman spectrum. As shown in Figure 1f, there are two low frequencies Ag‐like modes locating at 136.8 and 144.5 cm −1 corresponding to the out‐of‐plane vibrations of Re atoms and four Eg‐like modes locating at 153.6, 163.4, 218.2, and 238.1 cm −1 corresponding to the in‐plane vibrations of Re atoms.…”
Section: Resultsmentioning
confidence: 99%
“…11 A comparison of optoelectronic performances between our device and previously reported ferroelectric-gated 2D phototransistors in key figures of merit is shown in Figure 5g. [15][16][17]21,23,24,30,42,43 The 10.2 nm thick Al:HfO 2 ferroelectric layer enables nanoscale polarization control via the proposed novel bipolar pulses method to tune the channel in a fully depleted state. D*/Thk was defined to characterize the photoresponse sensitivity dependence of the thickness of the ferroelectric layer, where D* is detectivity and Thk represents the thickness of the dielectric layer, corresponding to the gating capacity of the floating-gate layer.…”
Section: Polarizable Nonvolatile Al:hfo 2 Gating In Monolayer Mos 2 P...mentioning
confidence: 99%
“…To address these challenges, two-dimensional (2D) materials-based phototransistors have been proposed due to their outstanding advantages of atomic scale in thickness, tunable band gap, absence of dangling bonds, and high carrier mobility. As a typical 2D material, monolayer MoS 2 has strong light–matter interactions and layer-dependent optoelectronic properties, exhibiting an ultrasensitive photoresponsivity as high as 880 A W −1 for visible light . In recent years, more and more 2D phototransistors with profound performances have been achieved with ferroelectrics employed including poly­(vinylidene fluoride-trifluoroethylene) (P­(VDF-TrFE)), PbZr x Ti 1– x O 3 (PZT) and SrBi 2 Ta 2 O 9 (SBT). Developing gate dielectric engineering with ferroelectrics in 2D phototransistors is an effective strategy for the optimization of photodetection due to their spontaneous reversal of polarization with the switching of an external electric field, which could introduce a negative capacitance effect to obtain gate voltage amplification or modulate the carrier type to define homojunction or heterojunction. However, most of the phototransistors with high sensitivity inevitably operate with a high gate bias, which usually suffers from severe leakages and large power dissipation. Since the switchable and nonvolatile remanent polarization could provide an ultrahigh local electrostatic field in the semiconducting channel, ferroelectrics are expected to be employed as a floating gate to locally define the potential profile in a 2D channel, which contributes to the efficient modulation of carrier concentration and Schottky barrier height without constant gate voltage, enabling ultrasensitive photodetector with low power dissipation.…”
Section: Introductionmentioning
confidence: 99%
“…[226,227] A flexible photodetector on polyimide substrate with ferroelectric polymer film as a gate has been demonstrated to yield enhanced performance under strain modulation by bending. [304] ReX 2 transistors incorporating hexagonal boron nitride (h-BN) as a gate dielectric have demonstrated high field-effect mobility due to the reduced trap density at the channel-substrate interface (Table 4). [67,290,305,306]…”
Section: Recent Advances In Res 2 Based Photodetectorsmentioning
confidence: 99%