2019
DOI: 10.1016/j.cap.2018.10.012
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High-performance Zinc-Tin-Oxide thin film transistors based on environment friendly solution process

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Cited by 43 publications
(19 citation statements)
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“…While this mobility can be compared to that of our previous research on spin coated-(1.05 cm 2 V −1 s −1 ) and inkjet processed-(1.2 cm 2 V −1 s −1 ) ZTO TFT with Ag screen-printed S/D 21 , it was lower than that of other solution processed ZTO with vacuum deposited S/D 24 . The improved mobility value of their TFT devices may be explained due to two main reasons: (1) tighter contact between ZTO and metal S/D, and better connection of metal particles in vacuum and (2) lower work function (ϕ) 24 difference between S/D electrode and ZTO semiconductor compared to our devices, in which electron carriers have to overcome to be injected into the semiconductor layer (ϕ A1 = 4.28 eV 25 , ϕ ZTO = 4.35 eV 23 , ϕ Ag = 4.6 eV 25 ). Turn-on voltage, which is gate voltage required to turn on/off the transistor in a switching application, is of around 4 V with our device.…”
Section: Resultsmentioning
confidence: 99%
“…While this mobility can be compared to that of our previous research on spin coated-(1.05 cm 2 V −1 s −1 ) and inkjet processed-(1.2 cm 2 V −1 s −1 ) ZTO TFT with Ag screen-printed S/D 21 , it was lower than that of other solution processed ZTO with vacuum deposited S/D 24 . The improved mobility value of their TFT devices may be explained due to two main reasons: (1) tighter contact between ZTO and metal S/D, and better connection of metal particles in vacuum and (2) lower work function (ϕ) 24 difference between S/D electrode and ZTO semiconductor compared to our devices, in which electron carriers have to overcome to be injected into the semiconductor layer (ϕ A1 = 4.28 eV 25 , ϕ ZTO = 4.35 eV 23 , ϕ Ag = 4.6 eV 25 ). Turn-on voltage, which is gate voltage required to turn on/off the transistor in a switching application, is of around 4 V with our device.…”
Section: Resultsmentioning
confidence: 99%
“…Nevertheless, the fabrication of ZTO films using sputtering is a complex manufacturing process, involving a high vacuum. Hence, inexpensive and straightforward solution-based processes for ZTO synthesis have been investigated [ 41 , 42 , 43 ]. In the case of ZTO, however, patterning is complicated with solution process-based film synthesis, and ZTO crystallizes at approximately 500 °C.…”
Section: Zto Film and Applicationsmentioning
confidence: 99%
“…The sputtering method requires a high-cost and complex-to-fabricate vacuum process, but it enables one to obtain high uniformity in film quality [ 2 , 40 ]. Meanwhile, the solution-process approaches, such as spin coating, dipping, and bar coating, have the merit of a low-cost process [ 41 , 42 , 43 ], but these processes suffer from the difficulty of patterning. Different from the conventional solution processes, inkjet or screen printing offers simple-to-patterned deposition of the ZTO without an additional patterning process [ 46 , 48 , 49 ].…”
Section: Zto Film and Applicationsmentioning
confidence: 99%
“…Transparent Conductive Oxides (TCO) are typically materials having high optical transparency (80-90%) in the visible region, the wide band gap (because of the high electronegativity of oxygen in n-type TCOs, typically Eg ≥ 3.1 eV) and high electrical conductivity (Ikhmayies 2017). In the last two decades, interest in multicomponent TCOs such as Zinc Tin Oxide, Indium Tin Oxide (Sofi et al 2018), Indium Zinc Oxide (Craciun et al 2014, Zhang et al 2019 has been dramatically increased (Altınkök and Olutaş 2020). Among these TCOs, a-IGZO (amorphous-Indium Gallium Zinc Oxide) has emerged as a encouraging candidate, with the high mobility of this material (Sheng et al 2019).…”
Section: Introductionmentioning
confidence: 99%