2023
DOI: 10.1111/jace.19042
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High photostrictive efficiency of Mg3V2O8 ceramics under visible light illumination

Abstract: The materials showing significant photostrictive effect under visible light are of great interest for the development of advanced micro‐optomechanical systems (MOMS). Till date, ferroelectrics have remained the most widely investigated materials for photostriction, but due to wide bandgap their efficiency remains poor in visible light. Herein, magnesium orthovandate (Mg3V2O8) ceramics, showing a bandgap of 2.43 eV, is demonstrated for significant photostrictive efficiency (η) under visible light. In the illumi… Show more

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Cited by 4 publications
(2 citation statements)
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“…However, in the absence of a reliable method for decoupling the oxygen and argon plasma, we cannot determine whether oxygen plasma or argon plasma is the primary source of sputtering damage. When examining the reasons behind the relaxation of lattice strains due to plasma radiation, we should recognize that the light-induced alterations in lattice strain depend on various parameters, including photon energy, 38 wavelength, 39 intensity, and duration of illumination. 37,40 Given the potential of each of these factors to impact lattice strain through distinct mechanisms, and considering that plasma radiation was not identified as the primary contributor to sputtering damage, we refrained from conducting a separate and comprehensive study in the present work.…”
Section: Resultsmentioning
confidence: 99%
“…However, in the absence of a reliable method for decoupling the oxygen and argon plasma, we cannot determine whether oxygen plasma or argon plasma is the primary source of sputtering damage. When examining the reasons behind the relaxation of lattice strains due to plasma radiation, we should recognize that the light-induced alterations in lattice strain depend on various parameters, including photon energy, 38 wavelength, 39 intensity, and duration of illumination. 37,40 Given the potential of each of these factors to impact lattice strain through distinct mechanisms, and considering that plasma radiation was not identified as the primary contributor to sputtering damage, we refrained from conducting a separate and comprehensive study in the present work.…”
Section: Resultsmentioning
confidence: 99%
“…14 So far, various types of photostrictive materials have been reported, and mainly include: polar/non-polar semiconductors, transition metal oxides, ferrites, ferroelectrics, polymers and hybrid perovskites. 5,[14][15][16][17][18] While differing from each other in the origin or the underlying mechanisms responsible for their photostrictive effect, these material systems have been found to exhibit different responses for photostriction. With a photostrictive efficiency of r 10 À12 m 3 W À1 , a light-induced dimensional change of less than 10 À5 has been documented for non-polar materials, whereas, a relatively larger photostriction of 10 À5 -10 À4 against the photostrictive efficiency of 10 À12 -10 À10 m 3 W À1 has been reported for ferroelectric materials.…”
Section: Introductionmentioning
confidence: 99%