2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) 2016
DOI: 10.1109/am-fpd.2016.7543672
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High photothermal properties in silicon nanostructures

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“…On the other hand, the temperature of MPSi solution was more significantly increased from 23.7 • C to 45.3 • C, and the GO-wrapped FMPSi exhibited the maximal increase in temperature (up to 52.8 • C). These results indicate that silicon nanostructure with numerous mesopores exhibits high photo-induced hyperthermia due to its excellent photothermal conversion efficiency, high surface area, and low reflectivity (or antireflection) [64,65]. GO wrapping can further increase NIR absorption through the laser-induced reduction of GO [66,67].…”
Section: Photothermal Heating By Nir Irradiationmentioning
confidence: 87%
“…On the other hand, the temperature of MPSi solution was more significantly increased from 23.7 • C to 45.3 • C, and the GO-wrapped FMPSi exhibited the maximal increase in temperature (up to 52.8 • C). These results indicate that silicon nanostructure with numerous mesopores exhibits high photo-induced hyperthermia due to its excellent photothermal conversion efficiency, high surface area, and low reflectivity (or antireflection) [64,65]. GO wrapping can further increase NIR absorption through the laser-induced reduction of GO [66,67].…”
Section: Photothermal Heating By Nir Irradiationmentioning
confidence: 87%