2001
DOI: 10.1063/1.1415416
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High-power and long-lifetime InAs/GaAs quantum-dot laser at 1080 nm

Abstract: High power and long lifetime have been demonstrated for a semiconductor quantum-dot (QD) laser with five-stacked InAs/GaAs QDs separated by an InGaAs strain-reducing layer (SRL) and a GaAs spacer layer as an active medium. The QD lasers exhibit a peak power of 3.6 W at 1080 nm, a quantum slope efficiency of 84.6%, and an output-power degradation rate of 5.6%/1000 h with continuous-wave constant-current operation at room temperature. A comparative reliability investigation indicates that the lifetime of the InA… Show more

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Cited by 78 publications
(32 citation statements)
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“…[1][2][3][4][5][6][7][8][9][10][11][12][13][14] SAQDs are the result of a transition from 2D growth to 3D growth in strained epitaxial films such as Si x Ge 1Àx =Si and In x Ga 1Àx As/GaAs: This process is known as Stranski-Krastanow growth or VolmerWebber growth. 3,[15][16][17] In applications, order of SAQDs is a key factor.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8][9][10][11][12][13][14] SAQDs are the result of a transition from 2D growth to 3D growth in strained epitaxial films such as Si x Ge 1Àx =Si and In x Ga 1Àx As/GaAs: This process is known as Stranski-Krastanow growth or VolmerWebber growth. 3,[15][16][17] In applications, order of SAQDs is a key factor.…”
Section: Introductionmentioning
confidence: 99%
“…An important technological goal of research on QDs has been the development of lasers with emission at telecommunications wavelengths, i.e., 1.3-1.6 µm [11][12][13]. Many approaches have been adopted to extend the wavelength beyond the ∼1100 nm that is naturally reached by InAs QDs in GaAs.…”
Section: Introductionmentioning
confidence: 99%
“…1,2,3,4,5,6,7,8,9,10,11,12,13,14,15,16,17,18,19 For this reason, there has been a great deal of modeling work on their dynamic formation process. 20,21,22,23,24,25,26,27,28,29,30,31,32,33,34,35,36,37,38,39,40,41 SAQDs are fabricated by depositing a semiconductor film on a lattice mismatched substrate with a smaller band gap, the most well-known examples being Ge x Si 1−x deposited on Si and In x Ga 1−x As deposited on GaAs.…”
Section: Introductionmentioning
confidence: 99%