1993
DOI: 10.1063/1.109591
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High power, high brightness electron beam generation in a pulse-line driven pseudospark discharge

Abstract: High brightness (∼1010 A/m2 rad2), high power density (∼1010 W/cm2) electron beams have been generated by the mating of a hollow-cathode discharge device operating in the pseudospark regime to the output of a high power pulse line accelerator. Very small diameter (∼1 mm) electron beams with currents in the range 500–1000 A and energies in the range 150–300 keV have been generated with effective emittances estimated to be at or below 170 mm mrad. Such emittances are comparable to those achieved in conventional … Show more

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Cited by 37 publications
(10 citation statements)
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“…A characteristic feature of this type of discharge is the generation of distinctive electron beams, before and at the time of voltage collapse [7][8][9][10]. These high-power high-brightness electron beams [11] were successfully tested for applications such as thin-film deposition, plasma processing, intense pulsed charged particle sources, and X-ray sources [12]. The processes leading to beam generation are not completely understood, although it is known that they are related to plasma formation in the low E/N (the reduced electric field) region inside the hollow cathode region (HCR) [13,14].…”
mentioning
confidence: 98%
“…A characteristic feature of this type of discharge is the generation of distinctive electron beams, before and at the time of voltage collapse [7][8][9][10]. These high-power high-brightness electron beams [11] were successfully tested for applications such as thin-film deposition, plasma processing, intense pulsed charged particle sources, and X-ray sources [12]. The processes leading to beam generation are not completely understood, although it is known that they are related to plasma formation in the low E/N (the reduced electric field) region inside the hollow cathode region (HCR) [13,14].…”
mentioning
confidence: 98%
“…A clear distinction between these kind of electron beams and classical electron sources based on thermoionic or field emission has to be made. These high-power high-brightness beams [2] were successfully tested for applications such as thin-film deposition, plasma processing, intense pulsed charged particle sources, and X-ray sources [1].…”
Section: Introductionmentioning
confidence: 99%
“…Only the high energy component of the electron beam can interact with the electromagnetic wave to generate high frequency radiation. Destler found the diameter of the high energy 200keV part of the electron beam was in the range of 0.2 to 1.4 mm using a copper stopping foil and heat sensitive polycarbonate sheet 14 . Zhu found electron beam damage patterns on acid-sensitive discoloring film and copper foil and then observed the damage holes had diameters in the 0.3 mm to 0.5 mm range 15 …”
Section: Introductionmentioning
confidence: 99%