2020
DOI: 10.1016/j.ssi.2020.115377
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High power iron phosphate cathodes by atomic layer deposition

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Cited by 5 publications
(6 citation statements)
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“…Gandrud et al59 and Brennhagen et al60 also successfully deposited (non-lithiated) iron phosphate, but this was done by using Fe(thd) 3 as iron precursor rather than FeCp 2 or FeCl Tin phosphate. The need for a highly reactive co-reactant after the TMP pulse was also discussed by Park et al,41 who reported deposition of tin phosphate using TDMASn and TMP.…”
mentioning
confidence: 99%
“…Gandrud et al59 and Brennhagen et al60 also successfully deposited (non-lithiated) iron phosphate, but this was done by using Fe(thd) 3 as iron precursor rather than FeCp 2 or FeCl Tin phosphate. The need for a highly reactive co-reactant after the TMP pulse was also discussed by Park et al,41 who reported deposition of tin phosphate using TDMASn and TMP.…”
mentioning
confidence: 99%
“…47 For the operando measurement, the background (empty operando cell) was subtracted in pdfgetx3 (through pdfgetx3_gui.py 47 ) with a background scale of 1. Cu and Na peaks from the operando measurement were subtracted using a homemade Python script (peakremoval_xy.py 48 ), where start and end values in Q were chosen The XRD data from ex situ measurements were converted to PDFs using pdfgetx3_gui.py by manually adjusting the background scale (for appropriate subtraction of the Ar-filled 1 mm capillary background) and with the same Q and r poly values as for the operando data. Rietveld refinements and fitting of PDF data were performed with Topas v6.…”
Section: Preparation Of Post-mortem Samples For Xrd and Xasmentioning
confidence: 99%
“…To solve these problems, great efforts were taken into developing advanced microelectrode manufacturing methods. 54 Several deposition technologies, including physical vapor deposition (PVD), 55 pulsed laser deposition (PLD), 56 chemistry vapor deposition (CVD), 57 and atomic layer deposition (ALD), [57][58][59] have been adopted to fabricate micro-LIBs with laminated thin film structure. Among them, ALD is an effective method to manufacture high quality thin-film electrodes.…”
Section: Laminated Thin Film Structurementioning
confidence: 99%
“…It has the following advantages in fabrication of laminated thin lm structured micro-LIBs: (i) the chemisorption of precursors onto the substrate material ensures excellent adhesion; (ii) the selflimiting nature of the surface reaction makes it possible to automate the process without the need for precise dose control and continuous operator intervention; (iii) the ordered growth processes of lms provide high thickness accuracy without in situ feedback; (iv) the surface reaction ensures high conformability of the lm with the matrix, regardless of whether the substrate is dense, porous, tubular, powdered or other complex shapes; (v) ALD can deposit ultra-thin and dense layers less than 1 nm with good repeatability; (vi) the surface-controlled growth characteristics make it possible to expand the throughput by increasing the batch size and substrate area. 58,59 Besides ALD, the tape-casting technique was also employed to prepare a laminated micro-LIB jet with relatively thick lms (micro-scale). 60 The principle of tape-casting is that the crushed powders and organic plasticizer solution are mixed in an appropriate ratio to make a slurry with specic viscosity.…”
Section: Laminated Thin Lm Structurementioning
confidence: 99%