1998
DOI: 10.1016/s0022-0248(98)00564-8
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High-power, single-mode, Al-free InGaAs(P)/InGaP/GaAs distributed feedback diode lasers

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Cited by 15 publications
(9 citation statements)
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“…The p-cladding and contact layers are then deposited in a second growth step. For this reason, Mawst et al (1998) suggest and then realize (Earles et al, 1998) an aluminum-free DFB structure, where the grating is etched into an InGaP layer and regrown by a GaAs layer. For this reason, Mawst et al (1998) suggest and then realize (Earles et al, 1998) an aluminum-free DFB structure, where the grating is etched into an InGaP layer and regrown by a GaAs layer.…”
Section: Gratings With Epitaxial Overgrowthmentioning
confidence: 99%
See 1 more Smart Citation
“…The p-cladding and contact layers are then deposited in a second growth step. For this reason, Mawst et al (1998) suggest and then realize (Earles et al, 1998) an aluminum-free DFB structure, where the grating is etched into an InGaP layer and regrown by a GaAs layer. For this reason, Mawst et al (1998) suggest and then realize (Earles et al, 1998) an aluminum-free DFB structure, where the grating is etched into an InGaP layer and regrown by a GaAs layer.…”
Section: Gratings With Epitaxial Overgrowthmentioning
confidence: 99%
“…For this reason, Mawst et al (1998) suggest and then realize (Earles et al, 1998) an aluminum-free DFB structure, where the grating is etched into an InGaP layer and regrown by a GaAs layer. The design proposed by Mawst et al (1998) is, however, limited to wavelengths above the absorption gap of GaAs. The design proposed by Mawst et al (1998) is, however, limited to wavelengths above the absorption gap of GaAs.…”
Section: Gratings With Epitaxial Overgrowthmentioning
confidence: 99%
“…11b. The corrugated grating spans the whole length of the device [97,98]. To realize electrical contacting it has to be buried as depicted in Fig.…”
Section: Diode Lasers With Integrated Bragg Reflectorsmentioning
confidence: 99%
“…Epitaxial regrowth in GaAs-based structures is problematic, mainly due to the Al containing layers within the structure, which, when exposed to oxygen, result in poor regrowth interfaces that are deleterious to the laser performance. Previous solutions have included the use of Al-free epitaxial structures [3], steam oxidation for current confinement [4], in situ etching and regrowth within a metal-organic vapor phase epitaxy (MOVPE) reactor [5], and antiguided [6], buried ridge [7], or self-aligned structures [8], [9], where Al layers were exposed to oxygen. All these have associated difficulties in process control, reliability, and design flexibility.…”
Section: Introductionmentioning
confidence: 99%