High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System

Weilin, 程伟林 Cheng; Fang, 张方 Zhang; Dongliang, 林栋梁 Lin; Aijun, 曾爱军 Zeng; Baoxi, 杨宝喜 Yang; Huijie, 黄惠杰 Huang

doi:10.3788/aos201838.0722001

光学学报

2018

DOI: 10.3788/aos201838.0722001

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High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System

程伟林 Cheng Weilin¹,

张方 Zhang Fang²,

林栋梁 Lin Dongliang³

et al.

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Design of a high uniform collimation illumination system for near field measurement

Dong¹,

Xu²,

Lv³

et al. 2021

OSA Continuum

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In this paper, focusing on the needs of near-field measurement lighting, a lighting system with high collimation and uniformity is designed, using filament high-heat illuminant as radiation source. The general design idea of dividing the illumination system into “collimating optical cavity” and “homogenizing optical cavity” is put forward. The design process of “collimating optical cavity” is given, and two different structural forms of “homogenizing optical cavity” are analyzed and the design results are given. The lighting effect is obtained by using simulation software, and the established parameters are achieved.

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Design of a high uniform collimation illumination system for near field measurement

Dong¹,

Xu²,

Lv³

et al. 2021

OSA Continuum

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Illumination Field Uniformity Correction by Novel Finger Arrays for Lithography Illumination System

Luo,

Liu,

Jin

et al. 2024

Photonics

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In order to correct the integrated nonuniformity of a lithographic illumination field, a high-precision uniformity correction method for an advanced lithographic illumination system is proposed. The method adopts the opaque finger array structure and improves correction ability and accuracy by optimizing the arrangement and structure of the unit without changing the width of each unit. The correction accuracy is expressed as the percentage of the corrected integrated nonuniformity. Through theoretical analysis and simulation, it can be seen that the correction accuracy of a staggered finger array is better than 0.22%. When staggered and layered, the correction accuracy of a finger array is better than 0.14%, which is better than that of a non-layered finger array. When staggered, layered, and chamfered of each unit, the correction accuracy of the finger array structure is better than 0.12%.

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光刻机自由照明用微反射镜阵列设计

Zhang Jingwei,

Hu Jingpei,

Sun Mengjie

et al. 2024

Chin. J. Laser

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High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System

Cited by 4 publications

References 0 publications

Design of a high uniform collimation illumination system for near field measurement

Design of a high uniform collimation illumination system for near field measurement

Illumination Field Uniformity Correction by Novel Finger Arrays for Lithography Illumination System

光刻机自由照明用微反射镜阵列设计

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