2007
DOI: 10.1103/physrevlett.99.036403
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High Precision Quantum Control of Single Donor Spins in Silicon

Abstract: The Stark shift of the hyperfine coupling constant is investigated for a P donor in Si far below the ionization regime in the presence of interfaces using tight-binding and band minima basis approaches and compared to the recent precision measurements. In contrast with previous effective mass-based results, the quadratic Stark coefficient obtained from both theories agrees closely with the experiments. It is also shown that there is a significant linear Stark effect for an impurity near the interface, whereas,… Show more

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Cited by 119 publications
(154 citation statements)
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“…The strength of the hyperfine coupling between the electron and the two P nuclear spins (A i (E)) (ref. 19), as well as the electronic g factor (g e (E)) (ref. 20), has been calculated within the tight-binding formalism (see Methods).…”
Section: Discussionmentioning
confidence: 99%
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“…The strength of the hyperfine coupling between the electron and the two P nuclear spins (A i (E)) (ref. 19), as well as the electronic g factor (g e (E)) (ref. 20), has been calculated within the tight-binding formalism (see Methods).…”
Section: Discussionmentioning
confidence: 99%
“…The strength of hyperfine coupling, A, is proportional to the probability density j Cðr i Þ j 2 of the electron wavefunction at the site of the donor atom r i (ref. 19). An applied electric field (E) distorts the wavefunction and, therefore, modifies A.…”
Section: Methodsmentioning
confidence: 99%
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“…The tight-binding Hamiltonian of 1.4 million silicon atoms with a boron acceptor was represented with a 20-orbital sp3d5s* basis per atom including nearestneighbor and spin-orbit interactions. An acceptor was represented by a Coulomb potential of a negative charge screened by the dielectric constant of Si and subjected to an onsite cutoff potential U 0 [20]. The model provides an accurate solution for the single-hole eigenstates of a bulk acceptor, and an acceptor near an interface.…”
mentioning
confidence: 99%
“…This scaling method is also used in the literature to study the Stark shift of the HFS in Si:P devices [39,50] …”
Section: Donor Electron Wave Function Simulationsmentioning
confidence: 99%