2003
DOI: 10.1063/1.1625374
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High pressure electric discharge model applied to the halogen depletion instability development in a XeCl phototriggered laser

Abstract: Theoretical studies of a phototriggered XeCl excimer laser have been performed through the development of a zero-dimensional model and used for conditions close to experiment for about 50–100 ns laser pulse duration with electron power deposition in the MW/cm3 range and inside a 300 cm3 chamber. The well-known parallel resistor network model is used. The plasma generated by the impulse discharge is represented by one or more resistance in parallel, whose conductivity is proportional to the electron density. Ti… Show more

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Cited by 13 publications
(10 citation statements)
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“…In this section, we present some general results for the case of a uniform plasma. The scheme of the discharge model and external circuit are also shown in [6,7].…”
Section: Resultsmentioning
confidence: 99%
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“…In this section, we present some general results for the case of a uniform plasma. The scheme of the discharge model and external circuit are also shown in [6,7].…”
Section: Resultsmentioning
confidence: 99%
“…The solution of the KE leads to the determination of the electron density also required for the resistance calculation. The set of reactions and their rate coefficients used in the present calculations of the characteristics of the Ne-Xe-HCl mixture for laser discharge are reported in our previous works [6,7].…”
Section: The Phototriggered Xecl Laser Modelmentioning
confidence: 99%
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“…For the kinetic scheme, we use a Ne/Xe/HCl mixture with a chemistry mechanism that is basically the same as in Refs. [34,42]. This kinetic scheme is based on a full set of processes regrouped in 31 reactions involving 16 atomic, molecular, and photonic species, i.e., Ne, Xe, Xe * , NeXe ?…”
Section: Description Of the Modelmentioning
confidence: 99%
“…The solution of the system of kinetic equations is based on a set of reactions [13,15]: for the electron process, e + Xe ⇐⇒ e + Xe * ,…”
Section: Kinetics Model Of the Plasmamentioning
confidence: 99%