Undoped n‐InP and Zn‐doped p‐InP are grown by the SSD method. Hall measurements on wafers cut from the polycrystalline n‐InP ingots give values between 1015 and 1016 cm−3 for the carrier concentration averaged over the crystallites of the wafer. From the electron mobilities measured at 77 K on single crystalline samples (maximally 5.0 × 104 cm2/Vs) it can be concluded on the high purity and perfection of this material. Zn doping yields p‐InP with p = (3 to 4) × 1016 cm−3and μ = (113 to 140) cm2/Vs atroom temperature. The hole mobilities at 77 K(1700 to 2160 cm2/Vs) are the highest ones reported for InP up to now. By fitting of the p(T) curves between 30 and 500 K concentrations and activation energies for the shallow acceptor Zn and for a medium deep acceptor present beside Zn are determined.