2010
DOI: 10.1088/0256-307x/27/6/068101
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High Quality A1N with a Thin Interlayer Grown on a Sapphire Substrate by Plasma-Assisted Molecular Beam Epitaxy

Abstract: We report an AlN epi-layer grown on sapphire by plasma-assisted molecular beam epitaxy with a thin interlayer structure. The effects of growth mode on threading dislocations (TDs) and surface morphology are studied. Then an interlayer structure grown under a V/III ratio of 1 is adopted to improve the AlN crystalline quality. By optimizing the thickness of the interlayer, the TD density and surface roughness can be reduced simultaneously.

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Cited by 11 publications
(2 citation statements)
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“…In contrast, single-crystalline AlN exhibits superior optical properties due to the improved crystalline quality and reduced grain size. High-quality AlN film is generally grown on sapphire substrate through metal-organic chemical vapor deposition (MOCVD) [ 183 ] or molecular beam epitaxy (MBE) [ 184 ]. By optimizing the fabrication process, the highest obtained intrinsic Q -factor of an AlN microring resonator is 3.7 × 10 6 [ 43 ].…”
Section: Materials Platformsmentioning
confidence: 99%
“…In contrast, single-crystalline AlN exhibits superior optical properties due to the improved crystalline quality and reduced grain size. High-quality AlN film is generally grown on sapphire substrate through metal-organic chemical vapor deposition (MOCVD) [ 183 ] or molecular beam epitaxy (MBE) [ 184 ]. By optimizing the fabrication process, the highest obtained intrinsic Q -factor of an AlN microring resonator is 3.7 × 10 6 [ 43 ].…”
Section: Materials Platformsmentioning
confidence: 99%
“…Recently, with progress in the growth of high-quality bulk AlN [1,2], a lot of efforts have been devoted to GaN/AlN quantum dots [QDs] because of their unique properties such as broad emission wavelength range covering the whole visible light, which provides a promising way to achieve white light-emitting diodes [LEDs] [3]. Besides, the large conduction band offset (approximately 2 eV for GaN/AlN) offers a prospect to cover the fiber optical telecommunication wavelength range (1.3 to 1.55 μm) by intersubband transition [4,5].…”
Section: Introductionmentioning
confidence: 99%