Silicon carbide (SiC) is a promising platform for fabricating high voltage, high frequency, and high temperature electronic devices like metal oxide semiconductor field effect transistors (MOSFETs) where lots of junctions or interfaces are involved. Work function (WF) plays an essential role in these devices. However, the study of the effect of conductive type and polar surfaces on the WF of SiC is limited. Here, we report that WFs of silicon (Si)- and carbon (C)-terminated polar surfaces for both p-type and n-type conductive 4H-SiC single crystals are measured by scanning Kelvin probe microscopy (SKPFM). The results show that p-type SiC exhibits higher WF than n-type ones. The WF of C-terminated polar surface is higher than that of Si-terminated polar surface, which is further confirmed by the first-principle calculations. By revealing this long-standing issue, our work facilitates the fabrication and development of SiC-based electronic devices, which have tremendous potential applications in electric vehicles, photovoltaics, and so on. This work also shows that the SKPFM is a good method to identify polar surfaces of SiC and other polar materials nondestructively, quickly, and conveniently.