1991
DOI: 10.1016/0022-0248(91)91027-8
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High quality InP and In1−xGaxAsyP1−y grown by gas source MBE

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Cited by 28 publications
(4 citation statements)
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“…1, particularly the filled data points from Lambert et al, 2 suggests that a quantitative model for the group V incorporation in InGaAsP is possible. An accurate incorporation model, however, must consider the influence of numerous growth conditions.…”
Section: Introductionmentioning
confidence: 95%
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“…1, particularly the filled data points from Lambert et al, 2 suggests that a quantitative model for the group V incorporation in InGaAsP is possible. An accurate incorporation model, however, must consider the influence of numerous growth conditions.…”
Section: Introductionmentioning
confidence: 95%
“…Typically, in gas source molecular beam epitaxy ͑GSMBE͒ and chemical beam epitaxy ͑CBE͒, the group V species are supplied primarily in the form of As 2 and P 2 from the cracking of arsine ͑AsH 3 ͒ and phosphine ͑PH 3 ͒ in a high temperature ͑Ϸ1000°C͒ cell. Figure 1 shows the results of several authors [1][2][3][4][5][6][7] in which the As content in the solid, y, is plotted as a function of the arsine flow fraction, Y ϭF͑AsH 3 ͒/͓F͑AsH 3 ͒ϩF͑PH 3 ͔͒, where F denotes the hydride flow inputs to the cracker cell. Data are shown for lattice-matched InGaAsP layers grown on ͑100͒ InP substrates by GSMBE ͑open and filled data points͒ and CBE ͑designated by ϩ and ϫ͒.…”
Section: Introductionmentioning
confidence: 99%
“…Strained and lattice-matched InGaAsP epilayers grown on InP substrates for wavelength ranges of 1300-1550 nm have been well studied [1][2][3][4][5] and widely applied to devices for optical fiber communications. Strained and lattice-matched InGaAsP epilayers grown on InP substrates for wavelength ranges of 1300-1550 nm have been well studied [1][2][3][4][5] and widely applied to devices for optical fiber communications.…”
Section: Introductionmentioning
confidence: 99%
“…These early problems with the MBE growth of InP have resulted in the majority of InP thin film structures being grown from metal-organic and hydride-based precursors using either metal-organic vapour phase epitaxy (MOVPE) [6] or gas source molecular beam epitaxy (GSMBE) [7]. However, these growth techniques provide a different set of problems to MBE due to their use of environmentally unfriendly gaseous precursors that are generally toxic and difficult to handle.…”
mentioning
confidence: 99%