“…Despite the great importance, this issue is still poorly addressed for the In/AlGaAs system. Separate studies of the droplet epitaxial In/AlGaAs growth are presented in the literature [16,22,23], but there is a lack of comparative studies of the growth on surfaces at various Al contents with all other growth conditions being equal. Nevertheless, a study of the Al content influence on In droplet parameters is important in the sense that droplet epitaxy has a number of advantages, such as high quality of structures and good optical characteristics of light-emitting devices [16,[24][25][26][27][28], low QD density when creating single-photon emitters [29][30][31][32], possibility to avoid the formation of a wetting layer [18,[32][33][34][35] which increases the dark current of photodetectors and generally degrades optical characteristics of devices [36,37], etc.…”