High quality superconducting niobium films produced by an ultra-high vacuum cathodic arc

Russo, R.; Catàni, L.; Cianchi, A.; Tazzari, S.; Langner, J.

doi:10.1088/0953-2048/18/7/l01

Cited by 32 publications

(27 citation statements)

References 19 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Due to a relatively small film thickness X-rays are not all stopped in the niobium film but also penetrate the substrate. When the substrate is copper they produce The superconducting critical temperatures T c have been measured using an inductive technique described elsewhere [20]. Results range from 9.20K to 9.32K with a transition width always less than 0.02K, in good agreement with Nb bulk data (T c = 9.26K ∆T c ∼ 0.01K); a few typical transitions are shown in Fig.5.…”

Section: Results On Niobium Filmssupporting

confidence: 59%

UHV arc for high quality film deposition

Russo

Cianchi²,

Akhmadeev

et al. 2006

Surface and Coatings Technology

View full text Add to dashboard Cite

The vacuum arc is a well-known technique for producing coatings with enhanced adhesion and film density. Many cathodic arc deposition systems are actually in use in industry and research. They all work under (high) vacuum conditions in which water vapour pressure is an important source of film contamination, especially in the pulsed arc mode of operation. Here we present a cathodic arc system working under ultra-high vacuum conditions (UHVCA). We have used for arc ignition a Nd-YAG pulsed laser focused on the cathode surface, which provides a reliable system and allows eliminating all possible sources of contaminants. We have proven that the arc technique produces bulk-like films suitable for superconducting applications. UHVCA has been used to produce ultra-pure niobium films with excellent structural and electrical properties at a deposition temperature lower than 100oC. The UHVCA technique therefore opens up new perspectives for all applications requiring pure films and low deposition temperatures.

show abstract

Section: Results On Niobium Filmssupporting

confidence: 59%

UHV arc for high quality film deposition

Russo

Cianchi²,

Akhmadeev

et al. 2006

Surface and Coatings Technology

View full text Add to dashboard Cite

show abstract

“…UHV sources are not commercially available, although a couple other groups have presented designs for UHV cathodic arc sources. [26][27][28][29] Our design is highlighted in Figs. 4(a)-4(e).…”

Section: Cathodic Arc Chamber Lid Features (Figures 4(a)-4(e))mentioning

confidence: 99%

Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation

Schroeder

Thomson

Howard

et al. 2015

Review of Scientific Instruments

View full text Add to dashboard Cite

, Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation, 2015, Review of Scientific Instruments, (86), 9, 095113. http://dx.doi.org/10.1063/1. Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (>50 keV), high photon flux (>10 12 ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (<1 s) two-dimensional (2D) detector, permits time-resolved in situ structural analysis of thin film formation processes. The high-energy synchrotron-radiation based x-rays result in small scattering angles (<11• ), allowing large areas of reciprocal space to be imaged with a 2D detector. The system has been designed for use on the 1-tonne, ultra-high load, high-resolution hexapod at the P07 High Energy Materials Science beamline at PETRA III at the Deutsches Elektronen-Synchrotron in Hamburg, Germany. The deposition system includes standard features of a typical UHV deposition system plus a range of special features suited for synchrotron radiation studies and industry-relevant processes. We openly encourage the materials research community to contact us for collaborative opportunities using this unique and versatile scientific instrument. C 2015 AIP Publishing LLC. [http://dx

show abstract

“…T c = 9.26 K, ΔT c = 0.02 K and J c = 3x10 7 A/cm 2 [10]. Scanning Electron Microscopy (SEM) is a very useful tool to perform the surface quality inspection for small-scale defects and to look at the surface structure.…”

Section: Formation and Properties Of Uhv Arc-deposited Supercondmentioning

confidence: 99%

Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers

Langner

Sadowski

Strzyżewski

et al. 2006

2006 International Symposium on Discharges and Electrical Insulation in Vacuum

View full text Add to dashboard Cite

The paper reports on recent progress in the application of the UHV arc technology, which was proposed as an alternative solution for the deposition of thin superconducting films of pure niobium (Nb) upon the inner surfaces of RF cavities designed for particle accelerators. There are presented new experimental studies aimed at the deposition of superconducting films of pure niobium (Nb) and lead (Pb) needed for the modern accelerator technology. The main experimental results and characteristics of arc-deposited thin superconducting films are discussed, and the progress achieved recently in the formation of such films is presented. 1) The Andrzej Soltan Institute for Nuclear Studies, 05-400 Otwock-Swierk, Poland.2) University Tor Vergata and INFN Roma 2, 00-133 Rome, Italy.3) University of Napoli and INFN-NA, Napoli, Italy. Abstract -The paper reports on recent progress in the application of the UHV arc technology, which was proposed as an alternative solution for the deposition of thin superconducting films of pure niobium (Nb) upon the inner surfaces of RF cavities designed for particle accelerators. There are presented new experimental studies aimed at the deposition of superconducting films of pure niobium (Nb) and lead (Pb) needed for the modern accelerator technology. The main experimental results and characteristics of arc-deposited thin superconducting films are discussed, and the progress achieved recently in the formation of such films is presented.

show abstract

High quality superconducting niobium films produced by an ultra-high vacuum cathodic arc

Cited by 32 publications

References 19 publications

UHV arc for high quality film deposition

UHV arc for high quality film deposition

Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation

Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers

Contact Info

Product

Resources

About