2007
DOI: 10.1016/j.jcrysgro.2006.10.216
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High reflectivity AlGaN/AlN DBR mirrors grown by MOCVD

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Cited by 13 publications
(9 citation statements)
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“…Based on the reflectivity measurements, the shorter peak could also be a polariton mode. At certain wavelengths, both types of mode could be formed, which can be separately activated by passing through different lasing thresholds [18]. This could explain why the sudden narrowing of the peak appears to happen twice while increasing with power in figure 4(a).…”
Section: Resultsmentioning
confidence: 96%
See 1 more Smart Citation
“…Based on the reflectivity measurements, the shorter peak could also be a polariton mode. At certain wavelengths, both types of mode could be formed, which can be separately activated by passing through different lasing thresholds [18]. This could explain why the sudden narrowing of the peak appears to happen twice while increasing with power in figure 4(a).…”
Section: Resultsmentioning
confidence: 96%
“…Recently, nanoporous GaN (NP-GaN) have been reported as a method to create high reflectance lattice-matched GaN DBRs [8,[15][16][17]. It offers an alternative to other epitaxial GaN-based DBRs that usually require many pairs of alternating layers before achieving desired results such as AlGaN/GaN [18]. In this paper, we will demonstrate high quality InGaN-based microdisk cavities with 3.5 µm diameter, which includes a bottom NP-GaN DBR and a top dielectric DBR.…”
Section: Introductionmentioning
confidence: 99%
“…The optically pumped AlGaN vertical-cavity surface-emitting laser had been reported in the deep ultraviolet range. The epitaxial AlN/AlGaN -distributed Bragg reflector (DBR) structures had been reported for the DUV wavelength range; they had a large lattice mismatch, a small refractive index, different properties, and a long epitaxial growth time. The n + -AlGaN:Si epitaxial layer with a high refractive index can be transformed into the conductive porous AlGaN:Si layer with a low refractive index through an electrochemical (EC) wet etched process.…”
Section: Introductionmentioning
confidence: 99%
“…Nevertheless, in most reports of AlN-GaN-based (AlN/GaN, AlGaN/GaN or AlGaN/AlN) DBRs, the DBRs were deposited on sapphire substrates. [11][12][13][14][15][16][17][18] There are very few reports of DBRs on Si substrates [19][20][21] because the DBRs would induce tensile stress, leading to crack formation. Regarding AlN-GaN-based DBRs on Si substrates, Ishikawa et al 20) achieved crack-free DBR-based LEDs on Si substrates, but only three pairs of DBR structures were fabricated, and vertical-conducting DBR-LEDs were not realized, because of the insulating AlN and high-resistivity AlGaN layers and the large band offset at the AlN/Si interface.…”
mentioning
confidence: 99%