High-reflectivity monomode-fibre grating filters

Bennion, I.; Reid, D.C.J.; Rowe, C.J.; Stewart, William

doi:10.1049/el:19860234

Cited by 64 publications

(15 citation statements)

References 1 publication

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“…There are several methods for machining of silica glass and other inorganic transparent materials, such as optical lithography [1], electron beam lithography [2,3], ion implant etching, focused ion beam etching [4], and direct optical machining by laser light or synchrotron radiation. Nanomachining has already been implemented by electron beam lithography, optical lithography, and focused ion beam etching.…”

Section: Micromachining Of Transparent Materialsmentioning

confidence: 99%

Ablation of silica glass induced by laser plasma soft X‐ray irradiation

Makimura

Fujimori

Torii

et al. 2011

Elect Comm in Japan

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SUMMARYSilica glass can be ablated using focused laser plasma soft X-rays. The ablation technique enables us to fabricate trenches with a width as narrow as 50 nm. In the present paper, we have investigated the nano-ablation process. The soft X-ray irradiation causes a silica surface broken into almost atomic species. Ionic species have kinetic energies higher than that gained by heating to the boiling point. We measured the ablation depth as a function of the soft X-ray fluence. The depth analysis revealed that soft X-rays are absorbed in a silica surface with an effective absorption depth of 10 nm. The result indicates that the energy density of the soft X-rays per unit volume at the threshold fluence is comparable to that required for breaking silica glass into atomic species. Further, the results suggest that ablation occurs before diffusion of absorbed energy into the surrounding region. In addition to energy absorption, repulsive forces between ionic species may cause ablation of the silica surface by soft X-ray irradiation. These properties of soft X-ray ablation may make possible the nano-ablation of silica glass.

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Section: Micromachining Of Transparent Materialsmentioning

confidence: 99%

Ablation of silica glass induced by laser plasma soft X‐ray irradiation

Makimura

Fujimori

Torii

et al. 2011

Elect Comm in Japan

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“…The use of phase masks for the production of fibre gratings was spurred by research such as that of Bennion et al who first demonstrated side-etched gratings in 1986 [1]. Later work by Hill et al [2] provided the necessary impetus for the mass production of fibre Bragg gratings (FBGs).…”

Section: Introductionmentioning

confidence: 99%

Femtosecond laser inscribed phase masks for fibre Bragg grating sensor inscription

Lee¹,

Kalli

Koutsides

et al. 2012

SPIE Proceedings

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We present femtosecond laser inscribed phase masks for the inscription of Bragg gratings in optical fibres. The principal advantage is the flexibility afforded by the femtosecond laser inscription, where sub-surface structures define the phase mask period and mask properties. The masks are used to produce fibre Bragg gratings having different orders according to the phase mask period. The work demonstrates the incredible flexibility of femtosecond lasers for the rapid prototyping of complex and reproducible mask structures. We also consider three-beam interference effects, a consequence of the zeroth-order component present in addition to higher-order diffraction components.

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“…Phase masks have been used for the production of fiber gratings since Bennion et al first demonstrated their use to produce side etched gratings in 1986 1 . In 1989Meltz et al 2 showed that gratings could be directly written into fiber using an interferometric approach involving a UV lasing exposure.…”

Section: Introductionmentioning

confidence: 99%

Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd, and 3rd order FBG gratings using a femtosecond laser

et al. 2009

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We present to the best of our knowledge the first example of femtosecond laser inscription/ablation of phase/amplitude masks for the demonstrated purpose of inscribing Bragg gratings in optical fibers. We show that the utilization of a femtosecond laser for the mask production allows for great flexibility in controlling the mask period. The masks are used to produce 1 st , 2 nd and 3 rd order fiber Bragg gratings (FBGs) in SMF-28. The work demonstrates the proof of concept and flexibility for the use of femtosecond lasers for the rapid prototyping of complex and reproducible mask structures. Our inscription studies are augmented by considerations of three-beam interference effects that occur as a result of the strong zeroth-order component that is present in addition to higher-order diffraction components.

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High-reflectivity monomode-fibre grating filters

Cited by 64 publications

References 1 publication

Ablation of silica glass induced by laser plasma soft X‐ray irradiation

Ablation of silica glass induced by laser plasma soft X‐ray irradiation

Femtosecond laser inscribed phase masks for fibre Bragg grating sensor inscription

Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd, and 3rd order FBG gratings using a femtosecond laser

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