High refractive index TiO<sub>2</sub> film deposited by electron beam evaporation

Yao, Jinping; Huang, Huiming; Y., J.; Jin, Yunxia; Zhao, Yuanan; Shao, Jian; He, Hongbo; Yi, K.; Fan, Zhengxiu; Feng, Zhaochi; Wu, Zhe

doi:10.1179/026708408x329498

Cited by 22 publications

(10 citation statements)

References 16 publications

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“…The value of ≈1.95 at 630 nm is in accordance with those reported in the literature [12,34,38]. In addition, the refractive index continuously increases with annealing temperature at 300-700 • C, then slightly decreases at 800 • C. The variation of refractive index can be a reflection of the change in the film density since they are closely related [38,39]. Namely, the film density increases with annealing temperature at 300-700 • C, then slightly decreases at 800 • C. It is possible that annealing at 300-700 • C induces structural relaxation and densification of the film, and hence increasing the refractive index.…”

Section: Resultssupporting

confidence: 90%

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Suppression of Oxygen Vacancy Defects in sALD-ZnO Films Annealed in Different Conditions

et al. 2020

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Zinc oxide (ZnO) has drawn much attention due to its excellent optical and electrical properties. In this study, ZnO film was prepared by a high-deposition-rate spatial atomic layer deposition (ALD) and subjected to a post-annealing process to suppress the intrinsic defects and improve the crystallinity and film properties. The results show that the film thickness increases with annealing temperature owing to the increment of oxide layer caused by the suppression of oxygen vacancy defects as indicated by the X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) spectra. The film transmittance is seldom influenced by annealing. The refractive index increases with annealing temperature at 300–700 °C, possibly due to higher density and crystallinity of the film. The band gap decreases after annealing, which should be ascribed to the decrease in carrier concentration according to Burstein–Moss model. The carrier concentration decreases with increasing annealing temperature at 300–700 °C since the oxygen vacancy defects are suppressed, then it increases at 800 °C possibly due to the out-diffusion of oxygen atoms from the film. Meanwhile, the carrier mobility increases with temperature due to higher crystallinity and larger crystallite size. The film resistivity increases at 300–700 °C then decreases at 800 °C, which should be ascribed primarily to the variation of carrier concentration.

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Section: Resultssupporting

confidence: 90%

“…Materials 2020, 13, x FOR PEER REVIEW 4 of 14 [38,39]. Namely, the film density increases with annealing temperature at 300-700 °C, then slightly decreases at 800 °C.…”

Section: Resultsmentioning

confidence: 99%

Suppression of Oxygen Vacancy Defects in sALD-ZnO Films Annealed in Different Conditions

et al. 2020

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“…[21][22][23][24][25][26] In selecting an appropriate deposition technology for this specific application, several criteria have to be considered such as coating morphology, deposition rate and coverage, interfacial quality, and industrial applicability. Among these methods, the ALD process is based on the sequential use of self-terminating surface reactions, which is perfect for the deposition of metal oxide layers with atomic layer control on geometrical nanostructures with high aspect ratios.…”

mentioning

confidence: 99%

Atomic layer deposition of nano-TiO<sub>2 </sub>thin films with enhanced biocompatibility and antimicrobial activity for orthopedic implants

Liu

Bhatia²,

Webster

2017

IJN

115

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Titanium (Ti) and its alloys have been extensively used as implant materials in orthopedic applications. Nevertheless, implants may fail due to a lack of osseointegration and/or infection. The aim of this in vitro study was to endow an implant surface with favorable biological properties by the dual modification of surface chemistry and nanostructured topography. The application of a nanostructured titanium dioxide (TiO 2 ) coating on Ti-based implants has been proposed as a potential way to enhance tissue-implant interactions while inhibiting bacterial colonization simultaneously due to its chemical stability, biocompatibility, and antimicrobial properties. In this paper, temperature-controlled atomic layer deposition (ALD) was introduced for the first time to provide unique nanostructured TiO 2 coatings on Ti substrates. The effect of nano-TiO 2 coatings with different morphology and structure on human osteoblast and fibroblast functions and bacterial activities was investigated. In vitro results indicated that the TiO 2 coating stimulated osteoblast adhesion and proliferation while suppressing fibroblast adhesion and proliferation compared to uncoated materials. In addition, the introduction of nano-TiO 2 coatings was shown to inhibit gram-positive bacteria ( Staphylococcus aureus ), gram-negative bacteria ( Escherichia coli ), and antibiotic-resistant bacteria (methicillin-resistant Staphylococcus aureus ), all without resorting to the use of antibiotics. Our results suggest that the increase in nanoscale roughness and greater surface hydrophilicity (surface energy) together could contribute to increased protein adsorption selectively, which may affect the cellular and bacterial activities. It was found that ALD-grown TiO 2 -coated samples with a moderate surface energy at 38.79 mJ/m 2 showed relatively promising antibacterial properties and desirable cellular functions. The ALD technique provides a novel and effective strategy to produce TiO 2 coatings with delicate control of surface nanotopography and surface energy to enhance the interfacial biocompatibility and mitigate bacterial infection, and could potentially be used for improving numerous orthopedic implants.

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“…In addition, crystallized TiO 2 is generally nontoxic, chemically and biologically stable, and well known for its applications in photocatalysis and dye synthesized solar cells [3,4]. Various methods or techniques have been investigated for the low temperature growth of high quality crystallized TiO 2 with varying degrees of success [5][6][7]. However, the films prepared using these methods are often amorphous.…”

Section: Introductionmentioning

confidence: 99%

TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application

Zhao

Child

Gibson

et al. 2014

Materials Research Bulletin

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High refractive index TiO₂ film deposited by electron beam evaporation

Cited by 22 publications

References 16 publications

Suppression of Oxygen Vacancy Defects in sALD-ZnO Films Annealed in Different Conditions

Suppression of Oxygen Vacancy Defects in sALD-ZnO Films Annealed in Different Conditions

Atomic layer deposition of nano-TiO<sub>2 </sub>thin films with enhanced biocompatibility and antimicrobial activity for orthopedic implants

TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application

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High refractive index TiO2 film deposited by electron beam evaporation

Cited by 22 publications

References 16 publications

Suppression of Oxygen Vacancy Defects in sALD-ZnO Films Annealed in Different Conditions

Suppression of Oxygen Vacancy Defects in sALD-ZnO Films Annealed in Different Conditions

Atomic layer deposition of nano-TiO<sub>2&nbsp;</sub>thin films with enhanced biocompatibility and antimicrobial activity for orthopedic implants

TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application

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Product

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High refractive index TiO₂ film deposited by electron beam evaporation

Atomic layer deposition of nano-TiO<sub>2 </sub>thin films with enhanced biocompatibility and antimicrobial activity for orthopedic implants