2021
DOI: 10.1007/s41365-021-00858-2
|View full text |Cite
|
Sign up to set email alerts
|

High-resolution ARPES endstation for in situ electronic structure investigations at SSRF

Abstract: Angle-resolved photoemission spectroscopy (ARPES) is one of the most powerful experimental techniques in condensed matter physics. Synchrotron ARPES, which uses photons with high flux and continuously tunable energy, has become particularly important. However, an excellent synchrotron ARPES system must have features such as a small beam spot, super-high energy resolution, and a user-friendly operation interface. A synchrotron beamline and an endstation (BL03U) were designed and constructed at the Shanghai Sync… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
21
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
8
1

Relationship

3
6

Authors

Journals

citations
Cited by 47 publications
(21 citation statements)
references
References 58 publications
0
21
0
Order By: Relevance
“…ZrTe 2 thin films were grown in situ in the integrated MBE/ARPES systems at the laboratory at Shanghai Jiao Tong University, beamlines 10.0.1 at Advanced Light Sources in Lawrence Berkeley National Laboratory, and beamline 13U at National Synchrotron Radiation Lab in Hefei. Samples were transferred via a vacuum suitcase to beamline 03U at Shanghai Synchrotron Radiation Facility 42 . Substrates of 4H-SiC were flash-annealed for multiple cycles to form a well-ordered bilayer graphene on the surface.…”
Section: Methodsmentioning
confidence: 99%
“…ZrTe 2 thin films were grown in situ in the integrated MBE/ARPES systems at the laboratory at Shanghai Jiao Tong University, beamlines 10.0.1 at Advanced Light Sources in Lawrence Berkeley National Laboratory, and beamline 13U at National Synchrotron Radiation Lab in Hefei. Samples were transferred via a vacuum suitcase to beamline 03U at Shanghai Synchrotron Radiation Facility 42 . Substrates of 4H-SiC were flash-annealed for multiple cycles to form a well-ordered bilayer graphene on the surface.…”
Section: Methodsmentioning
confidence: 99%
“…Synchrotron-based ARPES measurements were performed at beamline 13U of the National Synchrotron Radiation Laboratory (NSRL), China, and beamline 03U of the Shanghai Synchrotron Radiation Facility (SSRF), China [43]. The samples were cleaved in situ and measured under ultra-high vacuum below 5×10 -11 Torr.…”
Section: Methodsmentioning
confidence: 99%
“…ARPES measurements were performed at the 03U beamline of Shanghai Synchrotron Radiation Facility (SSRF) . The end-station was equipped with a Scienta-Omicron DA30 electron analyzer.…”
Section: Methodsmentioning
confidence: 99%
“…ARPES measurements were performed at the 03U beamline of Shanghai Synchrotron Radiation Facility (SSRF). 45 The endstation was equipped with a Scienta-Omicron DA30 electron analyzer. The angular and energy resolutions were set to 0.2°a nd 8−20 meV (dependent on the selected probing photon energy).…”
Section: ■ Methodsmentioning
confidence: 99%