High-resolution large-area patterning of photonic structures using a multibeam direct write laser lithography technology

Abstract

In this work, we report on the results obtained using a multibeam direct-write laser lithography technology for the fabrication of sub-micron photonic structures. This approach uses a state-of-the-art tool that simultaneously offers highthroughput and high-resolution fabrication capabilities for scalable nanotechnology applications. We demonstrate the capabilities of the multibeam laser lithography by optimizing and fabricating an anti-dot array. We show that our technology is capable of producing structures with feature sizes as small as 300 nm with high fidelity and uniformity. Moreover, we investigate the influence of various parameters, such as laser power, and focus settings on the resolution and quality of the fabricated structures. The potential of the multibeam laser lithography is further demonstrated for the exposure of large surface areas by fabricating a 12 cm x 12 cm photonic crystal array with critical dimensions of 600 nm. The uniformity and periodicity over the entire area are both investigated by extensive metrology, demonstrating high scalability. Overall, our results highlight the potential of multibeam laser lithography as a powerful method for industrial scale nanotechnology. The technique offers great versatility, making it an ideal tool for various applications in various fields of optics, from wafer-level integrated photonics to photonic bandgap structures, and from displays to large area Xray optics.