High-Resolution Soft X-Ray Microscopy

Feder, R.; Spiller, Eberhard; Topalian, J.; Broers, A. N.; Gudat, W.; Panessa, BJ; Zadunaisky, ZA; Sedat, John W.

doi:10.1126/science.406670

Cited by 90 publications

(16 citation statements)

References 7 publications

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“…Recognizing that 10–1000 eV electrons are also produced following X‐ray absorption in solids, groups at IBM ( Feder, 1970; Spiller, 1993) and at MIT ( Spears & Smith, 1972) began to use PMMA as a resist for studies of X‐ray lithography for microelectronics fabrication. The IBM group then realized that they had a technique for generating high resolution recordings of sub‐micrometre structures, and they produced a series of demonstrations of high resolution X‐ray contact microscopy ( Feder et al ., 1976 ; Feder et al ., 1977 ; Spiller et al ., 1976 ) using both laboratory and synchrotron X‐ray sources and scanning electron microscope (SEM) image enlargement. A large number of researchers have contributed various improvements to the technique.…”

Section: X‐ray Contact Microradiographymentioning

confidence: 99%

A numerical study of resolution and contrast in soft X‐ray contact microscopy

Wang

Jacobsen

1998

Journal of Microscopy

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SummaryWe consider the case of soft X-ray contact microscopy using a laser-produced plasma. We model the effects of sample and resist absorption and diffraction as well as the process of isotropic development of the photoresist. Our results indicate that the micrograph resolution depends heavily on the exposure and the sample-to-resist distance. In addition, the contrast of small features depends crucially on the development procedure to the point where information on such features may be destroyed by excessive development. These issues must be kept in mind when interpreting contact microradiographs of high resolution, low contrast objects such as biological structures.

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Section: X‐ray Contact Microradiographymentioning

confidence: 99%

A numerical study of resolution and contrast in soft X‐ray contact microscopy

Wang

Jacobsen

1998

Journal of Microscopy

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“…A variety of applications are increasingly supported by ultrashort and high-power coherent extreme ultraviolet (XUV)/soft-X-ray sources, such as biological imaging by "water window" (280-530 eV) soft X-rays [1], high spatial resolution microscopy [2], the study of electron dynamics by attosecond XUV/soft-X-ray pulses [3], and others [4,5]. Currently, high order harmonic generation (HHG) driven by femtosecond lasers is an efficient way of generating ultrashort coherent XUV/soft-X-ray pulses.…”

Section: Introductionmentioning

confidence: 99%

Optimization of a multi-TW few-cycle 1.7-µm source based on Type-I BBO dual-chirped optical parametric amplification

Xu¹,

Nishimura²,

Fu³

et al. 2020

Opt. Express

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This paper presents the optimization of a dual-chirped optical parametric amplification (DC-OPA) scheme for producing an ultrafast intense infrared (IR) pulse. By employing a total energy of 0.77 J Ti:sapphire pump laser and type-Ⅰ BBO crystals, an IR pulse energy at the center wavelength of 1.7 µm exceeded 0.1 J using the optimized DC-OPA. By adjusting the injected seed spectrum and prism pair compressor with a gross throughput of over 70%, the 1.7-µm pulse was compressed to 31 fs, which resulted in a peak power of up to 2.3 TW. Based on the demonstration of the BBO type-Ⅰ DC-OPA, we propose a novel OPA scheme called the "dual pump DC-OPA" for producing a high-energy IR pulse with a two-cycle duration.

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“…5). The x-ray replica shows a periodicity of 5 to 7 nm globules arranged in rows within the elliptical boundary of the granule (6,23). Because much thicker specimens can be imaged by x-ray contact microscopy than by conventional TEM and STEM, specimens that could only be viewed by high voltage electron microscopy (HVEM) can now be imaged with soft x-rays; without the severe specimen-beam damage (mass loss, heat .mage) associated with HVEM, and with the advantage of gaining information about the atomic number composition and distribution in the sample.…”

Section: Ideal Imaging Properties For Biological Samplesmentioning

confidence: 99%

Contact microscopy with synchrotron radiation

Panessa-Warren

1987

Biol Trace Elem Res

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Soft x-ray contact microscopy with synchrotron radiation offers the biologist and especially the raicroscopist, a way to morphologically study specimens that could not be imaged by conventional TEM, STEM or SEM methods (i.e. hydrated samples, samples easily damaged by. an electron beam, electron dense samples, thick specimens, unstained low contrast specimens) at spatial resolutions approaching those of the TEM, with the additional possibility to obtain compositional (elemental) information about the sample as well. Although flash x-ray sources offer faster exposure times, synchrotron radiation provides a highly collimated, intense radiation that can be tuned to select specific discrete ranges of x-ray wavelengths or specific individual wavelengths which optimize imaging or microanalysis of a specific sample. This paper presents an overview of the applications of x-ray contact microscopy to biological research and some current research results using monochromatic synchrotron radiation to image biological samples. INDEX ENTRIESBiological soft x-ray contact microscopy; X-ray resists; Absorption edge imaging; Synchrotron radiation. DISCLAIMER

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High-Resolution Soft X-Ray Microscopy

Cited by 90 publications

References 7 publications

A numerical study of resolution and contrast in soft X‐ray contact microscopy

A numerical study of resolution and contrast in soft X‐ray contact microscopy

Optimization of a multi-TW few-cycle 1.7-µm source based on Type-I BBO dual-chirped optical parametric amplification

Contact microscopy with synchrotron radiation

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