2011
DOI: 10.1016/j.ultramic.2011.01.039
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High resolution surface morphology measurements using EBSD cross-correlation techniques and AFM

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Cited by 30 publications
(20 citation statements)
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“…Here we extend the above comparisons, applying all four of EBSD, CRM, AFM, and FEA to a single test vehicle, a wedge indentation in a Si surface similar to those considered previously [17, 18], Fig. 1(a).…”
Section: Introductionmentioning
confidence: 87%
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“…Here we extend the above comparisons, applying all four of EBSD, CRM, AFM, and FEA to a single test vehicle, a wedge indentation in a Si surface similar to those considered previously [17, 18], Fig. 1(a).…”
Section: Introductionmentioning
confidence: 87%
“…Surface deformation around a similar wedge indentation was measured using atomic force microscopy (AFM) and compared with the deformation inferred from EBSD and predicted by a simple indentation model; the two measurements and model were in good agreement [18]. (In some earlier studies, AFM topography measurements were correlated with CRM measurements adjacent to surface scratches and Vickers indentations in Si, but in a qualitative manner [20, 21]. )…”
Section: Introductionmentioning
confidence: 99%
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“…Validation of EBSD-based measurements has also been examined through comparisons with the other existing measurement methods, including atomic force microscopy (AFM) [33], confocal Raman microscopy [33], UV-Raman microscopy [34], neutron diffraction [35], and X-ray microdiffraction [36]. In addition, comparisons with the results of finite element simulations have been performed [27,37].…”
Section: Introductionmentioning
confidence: 99%
“…In this technique, cross-correlation methods are applied to high resolution EBSD patterns obtained from unstrained and strained points on the same planar sample in such a way that the crystal lattices at the two points can be accurately compared to determine lattice strain and rotation [2,3]. This study is part of a project to create a reference artifact consisting of a die of silicon partially covered with a coherent epitaxial film of Si 1-…”
mentioning
confidence: 99%