Photolysis and desorption induced by ArF and KrCl laser irradiation of CH 2 I 2 , CH 3 I, CCl 4 , CHCl 3 , CH 2 Cl 2 , CF 2 Cl 2 , and CHF 2 Cl molecules adsorbed on fused silica were studied. One-photon fragmentation, as well as nonlinear dissociation and desorption processes, were observed. It was found that three-step fragmentation is a widespread phenomenon for molecules that experience resonant absorption of laser radiation. To explain the phenomenon, a mechanism based on stimulated emission was proposed. The nonlinear character of desorption is associated with redistribution of absorbed energy in adsorbed molecules and its transfer to the substrate.