2016
DOI: 10.1088/0957-4484/27/29/295101
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High sensitivity plasmonic biosensor based on nanoimprinted quasi 3D nanosquares for cell detection

Abstract: Quasi three-dimensional (3D) plasmonic nanostructures consisting of Au nanosquares on top of SU-8 nanopillars and Au nanoholes on the bottom were developed and fabricated using nanoimprint lithography with simultaneous thermal and UV exposure. These 3D plasmonic nanostructures were used to detect cell concentration of lung cancer A549 cells, retinal pigment epithelial (RPE) cells, and breast cancer MCF-7 cells. Nanoimprint technology has the advantage of producing high uniformity plasmonic nanostructures for s… Show more

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Cited by 46 publications
(32 citation statements)
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“…By analyzing this LSPR shift, small-sized entities, such as biological antibodies and low-concentration analytes, can be detected 9 , 10 . This technique can be used for monitoring viruses and cancer cells 11 13 . Thus, LSPR sensors have considerable potential for providing high sensitivity and label-free methods for emerging areas of biological detection.…”
Section: Introductionmentioning
confidence: 99%
“…By analyzing this LSPR shift, small-sized entities, such as biological antibodies and low-concentration analytes, can be detected 9 , 10 . This technique can be used for monitoring viruses and cancer cells 11 13 . Thus, LSPR sensors have considerable potential for providing high sensitivity and label-free methods for emerging areas of biological detection.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, for processing proteinaceous materials, femtosecond lasers offer a distinct advantage. Unlike nanoimprinting and ultraviolet lithography [126,127], femtosecond laser direct writing offers an excellent threedimensional fabrication ability and can be used to produce devices with nanometer precision. More importantly, biomaterials prepared using femtosecond laser direct writing can retain the biological activity of biomaterials [128,129].…”
Section: Biomedical Applicationsmentioning
confidence: 99%
“…11, a glass bead was used as a stamp to imprint photoresist on glass. The imprint process was carried out at 95 • C and 5 bar for 10 min, and 395 nm ultraviolet (UV) exposure for 2 min [30]. After demolding the glass bead at 20 • C, a spherical concave cavity was generated in the SU-8 over the glass substrate.…”
Section: Development Of Imprint Technology In Simentioning
confidence: 99%