2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC) 2015
DOI: 10.1109/pvsc.2015.7355967
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High Si content SRO/SiO2 bilayer superlattices with boron and phosphorus doping for next generation Si quantum dot photovoltaics

Abstract: Si quantum dots or interchangeably Si nanocrystals are promising materials for all-Si tandem solar cells in next generation photovoltaics. Si QDs in this study were fabricated by annealing sputtered Si rich oxide/SiO 2 (SRO/SiO 2 ) bilayer superlattice thin-films. Advantages of high Si content SRO layers include lower resistivity and higher light absorption crosssections which are more suitable for photovoltaic devices. However, theoretically high Si content SRO produces greater size distribution and larger Si… Show more

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Cited by 1 publication
(7 citation statements)
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“…1(a), 1(c), and 1(e). After hightemperature annealing, the crystallization of Si was confirmed for all samples by conventional TEM, X-ray diffraction, or Raman spectroscopy as demonstrated previously; 13) however, the morphology of the Si NCs was different between samples as shown in Figs. On the other hand, the P-doped Si NCs were separated by neighboring Si NCs.…”
supporting
confidence: 69%
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“…1(a), 1(c), and 1(e). After hightemperature annealing, the crystallization of Si was confirmed for all samples by conventional TEM, X-ray diffraction, or Raman spectroscopy as demonstrated previously; 13) however, the morphology of the Si NCs was different between samples as shown in Figs. On the other hand, the P-doped Si NCs were separated by neighboring Si NCs.…”
supporting
confidence: 69%
“…We suggest that this difference was due to the differences in Si NC sizes. 13) Next, we quantitatively demonstrate that the Si NC size contributes to the peak position and intensity between samples. Figures 4(a)-4(c) show the size distribution of Si NCs for all samples in a small volume range.…”
Section: B-dopedmentioning
confidence: 86%
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