High speed electron optics for direct slice writing

Abstract

Articles you may be interested inHigh-current electron optical design for reflective electron beam lithography direct write lithography J. Vac. Sci. Technol. B 28, C6C1 (2010); 10.1116/1.3505130 REBL: A novel approach to high speed maskless electron beam direct write lithography

Fast switching of magnetic fields in a magneto-optic trap

“…The MOT is just one of many experiments that employ electrical windings to rapidly switch or modulate magnetic fields. Examples include particle storage rings, 2 electron beam lithography, 3 and magnetic resonance imaging ͑MRI͒ scanners. 4 A related application is the active magnetic shielding of electron microscopes 5 and biomagnetic experiments, 6 where electrical coils are used to dynamically cancel external magnetic fields at frequencies up to ϳ1 kHz.…”

“…Similar problems arising from induced eddy currents are encountered in the other applications mentioned above. In the case of high speed magnetic deflection coils for electron beam lithography, eddy current effects can be minimized through careful use of materials, 3 or by shielding the deflection magnet within a ferrite cylinder. 8 Neither approach is practical for the MOT which utilizes a complex metal vacuum chamber that requires a high degree of optical access for the laser beams.…”