2005
DOI: 10.1109/lpt.2005.853296
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High-speed, high-responsivity, and high-power performance of near-ballistic uni-traveling-carrier photodiode at 1.55-/spl mu/m wavelength

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Cited by 90 publications
(33 citation statements)
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“…However, during photodiode operation, photogenerated holes with slow drift velocity are always a major factor limiting speed. The 'slow' hole problem is eliminated in the InP-based UTC photodiode structure [ Normalized to spiral antenna output UTC (NBUTC) photodiodes [56][57][58][72][73][74], where only electrons with high drift velocity act as active carriers. Figure 6 shows conceptual band diagrams for p-i-n, UTC and NBUTC photodiodes.…”
Section: Millimeter-wave Photonic Transmittersmentioning
confidence: 99%
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“…However, during photodiode operation, photogenerated holes with slow drift velocity are always a major factor limiting speed. The 'slow' hole problem is eliminated in the InP-based UTC photodiode structure [ Normalized to spiral antenna output UTC (NBUTC) photodiodes [56][57][58][72][73][74], where only electrons with high drift velocity act as active carriers. Figure 6 shows conceptual band diagrams for p-i-n, UTC and NBUTC photodiodes.…”
Section: Millimeter-wave Photonic Transmittersmentioning
confidence: 99%
“…This leads to a significant improvement in the effective carrier drift velocity of the photodiode during operation and excellent SCBP performance [28,70,71]. The major difference between the UTC photodiode and the NBUTC photodiode is the insertion of an additional p-type charge layer in the collector layer to control the distribution of the internal electrical field, which results in an over-shoot of the electron drift velocity even under high reverse bias voltage (-3 V) [56][57][58][71][72][73][74]. Figure 6(c) shows a conceptual band diagram for an NBUTC photodiode.…”
Section: Millimeter-wave Photonic Transmittersmentioning
confidence: 99%
“…To decrease the electron traveling time in the absorption layer, the introduction of a quasi-field into the absorption layer by means of the band-gap grading and/or doping grading are effective (Ishibashi et al, 1997. For decreasing the electron traveling time in the collection layer, p-type doping or cliff-like structure (Shi et al, 2005) are suitable for optimizing the electric field profile. On the other hand, to increase the saturation current level, increased ntype doping in the collection layer , Li et al, 2004) is preferable.…”
Section: Basic Characteristicsmentioning
confidence: 99%
“…13b,d,e, the i-InP carrier collection layer can be replaced with a dopedInP in order to avoid the space charge effect, and to accelerate electrons by near-ballistic (NB) transport behavior [60,61]. The former is sometimes called as chargecompensated (CC) structure [62].…”
Section: Carrier Transport Designmentioning
confidence: 99%