“…Amorphous SiO x NWs can be grown on a crystalline Si substrate by first depositing a thin metal film (Au, for example) on its surface and then heating the system to elevated temperatures (N1273 K) in an inert ambient (e.g. N 2 or Ar) containing trace amounts (3-5 ppm) of oxygen [2,3,[7][8][9][10][11][12][13][14][15]. Considering, for example, a thin Au film on the Si substrate, it is widely recognized [8,16] that, during the heating, the film breaks up into nanometer-scale islands and reacts with the Si substrate to form molten droplets of Au-Si eutectic composition (in fact, the Au/Si phase diagram has an eutectic point at 636 K corresponding to 18.6 at.% of Au, see Fig.…”