Z. anorg. allg. Chem.
 2002
DOI: 10.1002/1521-3749(200209)628:9/10<2185::aid-zaac2185>3.0.co;2-p
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High Temperature Chemical Vapor Deposition of Alumina Using Aluminum Tri-isopropoxide and Oxygen Mixture

Sabine Blittersdorf1,
Naoufal Bahlawane2,
Burak Atakan3
et al.
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