2009 International Semiconductor Device Research Symposium 2009
DOI: 10.1109/isdrs.2009.5378300
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High-temperature modeling of AlGaN/GaN HEMTs

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Cited by 97 publications
(15 citation statements)
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“…In the first stage of the study, the numerical models [2,22,23] were adapted to the specific features of the configuration and fabrication technology of actual device structures. It is well known that the parameters of the undoped AlGaN barrier layer located near the two-dimensional electron channel have a significant effect on the characteristics of a HEMT.…”
mentioning
confidence: 99%
“…In the first stage of the study, the numerical models [2,22,23] were adapted to the specific features of the configuration and fabrication technology of actual device structures. It is well known that the parameters of the undoped AlGaN barrier layer located near the two-dimensional electron channel have a significant effect on the characteristics of a HEMT.…”
mentioning
confidence: 99%
“…Moreover, to verify the temperature variation of V off , Figure 6 shows the measured and modeled V off at different channel temperatures. The measured V off is extracted from the transfer I-V curves of the GaN HEMT at different ambient temperatures, while the modeled V off is generated using (5). As the dissipation power is almost 0 when extracting V off , the channel temperature approximately equals to ambient temperature in this case.…”
Section: Resultsmentioning
confidence: 99%
“…The fundamental properties of GaN HEMTs that are affected by temperature mainly consist of the Schottky barrier height ϕ B , the band gap energy E g , the low-field mobility μ 0 , the maximal electron saturated velocity υ sat , and the heat conductivity k. One way to study the temperature effects on GaN HEMTs performance with regard to these properties is carried out involving solution of complicated numerical expressions. [5][6][7][8] However, these numerical simulations are very time consuming and difficult to incorporate in circuit simulators. In comparison, analytical model is preferred as it is length (L g ) in order to minimize the parasitic gate resistance.…”
Section: Introductionmentioning
confidence: 99%
“…It is obvious from the figure that the device is operated from V ds = 0 V to 15 V while keeping V gs = 0 V. A decline in I d after the onset of current saturation, as evident from Figure 4A is associated with the self-heating effect of the device. 15,34 Because of that, for V ds > V ds (sat) , I d continuously reduces its magnitude because a relative increase in channel temperature would increase scattering, causing a reduction in sat , which has a direct relationship with I d . Figure 4B,C shows modeled characteristics using Chattopadhyay 13 and Wang 14 models, respectively.…”
Section: Resultsmentioning
confidence: 99%