2012
DOI: 10.1007/s11837-012-0384-3
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High-Temperature Refining of Metallurgical-Grade Silicon: A Review

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Cited by 97 publications
(36 citation statements)
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“…Many previous studies on refining Si using plasma treatment or gas blowing showed similar trends, and the authors explained that this phenomenon is related to a half-order relation of steam to the elimination rate of B [24,31]. Generally, the required purity of Si for solar application is approximately 6N-7N with a B content of under 1.0 ppmw [32]. Our results did not meet the requirements, since we added excessive amount of B to our starting Si material.…”
Section: Experimental Studysupporting
confidence: 45%
“…Many previous studies on refining Si using plasma treatment or gas blowing showed similar trends, and the authors explained that this phenomenon is related to a half-order relation of steam to the elimination rate of B [24,31]. Generally, the required purity of Si for solar application is approximately 6N-7N with a B content of under 1.0 ppmw [32]. Our results did not meet the requirements, since we added excessive amount of B to our starting Si material.…”
Section: Experimental Studysupporting
confidence: 45%
“…The electronegativity of Ti is lower than Si. 27) Thus in the electrochemical production of Ti from Ti 5 Si 3 , Si will not anodically dissolve in the electrolyte, and the two elements will be separated. However, limited research has been done in the field of electrolytic separation pure elements from intermetallic compounds.…”
Section: Practical Reactionsmentioning
confidence: 99%
“…The primary intermetallic compounds at room temperature include η″ (Cu 3 Si), ε (Cu 15 Si 4 ), and γ (Cu 5 Si), and the eutectic temperature is 802 1C with a composition of 69.9 at.% Cu. Cu has been employed in the solvent refining to purify the metallurgicalgrade silicon, acting as an impurity trapper during the solidification (Johnston et al, 2012). This solvent refining method combined with the acid leaching can effectively reduce the impurity level.…”
Section: Introductionmentioning
confidence: 99%