2017
DOI: 10.1016/j.jmat.2017.06.002
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High-thermoelectric performance of TiO 2-x fabricated under high pressure at high temperatures

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Cited by 35 publications
(19 citation statements)
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“…High-pressure effects on the thermoelectric parameters of many other families of potential thermoelectric materials have also been considered in the literature. For example, among oxide materials that may be of interest for their thermoelectric properties, some attention has been paid to rutile, TiO 2−x , 148,149 and BiCuSeO. 150,151 It was found that non-stoichiometric samples of rutile (TiO 1.8 ) prepared under HP-HT conditions attain a relatively high ZT ∼ 0.35 at 700°C for a synthesis pressure of 5 GPa.…”
Section: Non-chalcogenide Thermoelectric Materialsmentioning
confidence: 99%
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“…High-pressure effects on the thermoelectric parameters of many other families of potential thermoelectric materials have also been considered in the literature. For example, among oxide materials that may be of interest for their thermoelectric properties, some attention has been paid to rutile, TiO 2−x , 148,149 and BiCuSeO. 150,151 It was found that non-stoichiometric samples of rutile (TiO 1.8 ) prepared under HP-HT conditions attain a relatively high ZT ∼ 0.35 at 700°C for a synthesis pressure of 5 GPa.…”
Section: Non-chalcogenide Thermoelectric Materialsmentioning
confidence: 99%
“…150,151 It was found that non-stoichiometric samples of rutile (TiO 1.8 ) prepared under HP-HT conditions attain a relatively high ZT ∼ 0.35 at 700°C for a synthesis pressure of 5 GPa. 148,149 For BiCuSeO adopting a ZrCuSiAs-type structure (P4/nmm space group), a pressure-driven enhancement of the power factor at 700 K was predicted. 150 Later, it was experimentally shown that HP-HT synthesis at 3 GPa significantly improves the figure of merit of BiCuSeO, which reaches ZT ∼ 0.4 at 800 K. 151 For the halide thermoelectric BiTeI, a non-monotonic pressure dependence of the bandgap was predicted, 152 and it was proposed that its power factor may be enhanced many fold at room temperature under appropriate combinations of initial charge carrier concentration and applied pressure.…”
Section: Non-chalcogenide Thermoelectric Materialsmentioning
confidence: 99%
“…The highest power factor value was 449 μW m −1 K −2 at 623 K for the 10 nm ZnO/GZO thin film, which is a competitive value among current GZO thin films 6,7,29,30 . Furthermore, compared with other n‐type oxygen‐containing TE systems at the same measurement temperature, such as Bi 2 O 2 Se, 31 In 2 O 3 , 32 TiO 2 , 33 and CaMnO 3 , 34 the TE performance achieved in this study is also superior, as shown in Figure 6B.…”
Section: Resultsmentioning
confidence: 86%
“…The highest power factor value was 449 μW m −1 K −2 at 623 K for the 10 nm ZnO/GZO thin film, which is a competitive value among current GZO thin films. 6,7,29,30 Furthermore, compared with other n-type oxygen-containing TE systems at the same measurement temperature, such as Bi 2 O 2 Se, 31 In 2 O 3 , 32 TiO 2 , 33 and CaMnO 3 , 34 the TE performance achieved in this study is also superior, as shown in Figure 6B. In this study, we successfully inserted a ZnO interlayer for GZO thin films grown on a c-sapphire substrate and investigated the effects of the ZnO layer on the TE properties of GZO thin films.…”
Section: Characterizationmentioning
confidence: 99%
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