High-throughput growth of HfO₂ films using temperature-gradient laser chemical vapor deposition

Abstract

In this study, HfO2 films were grown using a highly efficient HT-LCVD process with a large gradient (100 K mm−1) temperature field, achieving four novel microstructures which appeared simultaneously on a high-throughput sample.

Hybrid HfC‐SiCN matrix for improved oxidation resistance of carbon fiber–reinforced mini‐composites

“…Raman scattering spectra of the samples heated at 1200°C showed the formation of additional peaks in the low Raman shift range. These additional peaks suggested the initiation of oxidation at this temperature, which was typical for the growth of HfO 2 products 40 . Similarly, the Raman spectrum of the sample heated at 1500°C showed the presence of peaks corresponding to oxidation products in the low range; however, the intensity of D and G bands was greatly suppressed.…”

“…These additional peaks suggested the initiation of oxidation at this temperature, which was typical for the growth of HfO 2 products. 40 Similarly, the Raman spectrum of the sample heated at 1500 • C showed the presence of peaks corresponding to oxidation products in the low range; however, the intensity of D and G bands was greatly suppressed. This result might be related to the discoloration observed in the digital camera picture of the CF/HfC-SiCN1500 in Figure 5.…”