Optical Interference Coatings 2016 2016
DOI: 10.1364/oic.2016.wa.8
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High throughput PIAD with an advanced RF-plasma source and direct optical monitoring

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“…The cumulative effect of the thickness errors is reduced by using several witness chips that can be changed after the deposition of a certain number of layers. The described monitoring arrangement was initially developed for the monochromatic monitoring of coating production, but it can be also applied for layer thickness control with broadband monitoring strategies [15,16].…”
Section: Introductionmentioning
confidence: 99%
“…The cumulative effect of the thickness errors is reduced by using several witness chips that can be changed after the deposition of a certain number of layers. The described monitoring arrangement was initially developed for the monochromatic monitoring of coating production, but it can be also applied for layer thickness control with broadband monitoring strategies [15,16].…”
Section: Introductionmentioning
confidence: 99%