High vacuum chemical vapour deposition of oxides:

Kuzminykh, Yury; Dabirian, Ali; Reinke, Michael; Hoffmann, P.

doi:10.1016/j.surfcoat.2013.06.059

Cited by 36 publications

(35 citation statements)

References 48 publications

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“…[14] It consists of a stainless steel high vacuum chamber, which is evacuated by a series of primary and turbomolecular pump to a base pressure of 10 −7 hPa. During the deposition process, the pressure was maintained below 5 × 10 −5 hPa.…”

Section: Methodsmentioning

confidence: 99%

“…HV-CVD is a versatile technique for low temperature depositions as it allows the utilization of highly reactive precursor chemistries commonly used only in ALD processes. [14,15] Compared to conventional CVD processes, the high vacuum environment guarantees that gas phase reactions between the precursor molecules are negligible. We will summarize the principles and particularities of this deposition technique and describe in detail the epitaxial growth of the thin films.…”

Section: Introductionmentioning

confidence: 99%

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Low Temperature Epitaxial Barium Titanate Thin Film Growth in High Vacuum CVD

Reinke

Kuzminykh

Eltes

et al. 2017

Adv Materials Inter

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Barium titanate is a promising perovskite material, exhibiting numerous materials properties advantageous for a range of applications, such as ferroelectricity, piezoelectricity, a high dielectric constant, and large electrooptic coefficients. It represents a potential candidate for the implementation of high bandwidth and low energy consuming modulators for optical communication in future integrated systems. Integration of the optical components with electronic circuits on silicon requires, however, suitable low temperature deposition processes for the growth of high quality epitaxial BaTiO3 films, which are still missing. For integration of novel materials into the complementary metal–oxide–semiconductor platform, a variety of prerequisites must be fulfilled; among them there is a strict limitation of the thermal budget of the growth process. Furthermore, high growth rates are desirable for enhanced throughput. Many chemical vapor deposition (CVD) processes allow growing thin films at high rates, but epitaxial BaTiO3 film formation typically requires high substrate temperatures. It is demonstrated that high vacuum CVD is capable of growing epitaxial barium titanate films on magnesium oxide, strontium titanate, and strontium titanate buffered silicon substrates at process temperatures of 400 °C and growth rates of up to 100 nm h−1 without the need of an additional annealing step; this is the lowest substrate temperature reported for a CVD processes.

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Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Low Temperature Epitaxial Barium Titanate Thin Film Growth in High Vacuum CVD

Reinke

Kuzminykh

Eltes

et al. 2017

Adv Materials Inter

Self Cite

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show abstract

“…Conventionally, the processing pressure in a CVD chamber is kept at or below atmospheric (0.1 MPa) to avoid undesired homogeneous formation of nano-or microparticles in the gas phase. 5 At such pressures, the mean free path is 100 nm to microns, molecules transport into nanoscale openings primarily through effusion, and the rate of molecular transport into them is relatively slow. Elevating the pressure up to tens of MPa reduces the mean free path of molecules to a few nanometers, allowing them to flow into extremely confined geometries and react at enhanced rates.…”

Section: All Article Content Except Where Otherwise Noted Is Licensmentioning

confidence: 99%

Conformal coating of amorphous silicon and germanium by high pressure chemical vapor deposition for photovoltaic fabrics

Cheng

Grede

et al. 2018

APL Materials

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“…The method is particularly useful for the fabrication of thin-films of oxide materials. The process may be considered as a hybrid one involving low-pressure chemical vapour deposition (LP-CVD) and molecular beam epitaxy (MBE) [29]. Nevertheless, deposition rates up to 500 nm per hour have been achieved, indicating substantially higher rates than that achievable with an MBE process, which could lead to several micro-meters thick coatings.…”

Section: Chemical Vapour Deposition (Cvd)mentioning

confidence: 99%

The methodologies and strategies for the development of novel material systems and coatings for applications in extreme environments − a critical review

et al. 2018

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Abstract. The aim of this paper is to present a critical analysis of existing methodologies, approaches and strategies used to develop materials systems and coatings for uses in extreme environments. The extreme or harsh conditions encompass a large variety of in-service forms such as: extreme temperatures, abrasion, corrosion, impact and radiation that can exist in various applications such as those associated with aerospace and aeronautical engineering, land and marine transport, manufacturing machinery, and even microelectronics products. This article describes how working environment and required service performance of a particular part or structure could affect the choice of materials and surfaces to which it is composed. In addition, the paper explains the relevance that abusive working environments have for industry, especially relating to their costs, being followed by an overview of surface deposition approaches that are currently popularly used to improve performance of mechanical devices that need to combat adverse conditions. Finally, a material system and three kinds of protective coatings that could be used in applications in extreme conditions are described. The critical review is an outcome of the strategic review from the EU H2020 SUPERMAT project which deals with materials and manufacture for the products/structural parts used in extreme conditions. Keywords: extreme environment / material system / surface treatment / coating / economic impacts / case study Extreme environment and material-related issuesA harsh environment could be any environment that impedes the operation of a device/system. Many types of the conditions could be considered to be harsh, such as: extreme pressure/temperature, shock, vibration, chemical reactivity, radiation, corrosion and humidity, ranging from the applications in, such as alloy production, component manufacture, transport and biomedical implants [1] while the energy sector faces additional harsh environment such as that in various power plants [2], some of such examples being listed below: -Transport: Automobiles and airplanes that are operated in extreme conditions, being exampled by engines components and high-friction paired parts; -Energy: The devices/pipelines/components used for energy conversions, transports and storages, which faces high-temperature, various kinds of mediums and nuclear/chemical reactions, and suffer from corrosion and fatigue failures; -Manufacturing: Tools (e.g. cutting tools, dies and moulds, welding tools, high-temperature nozzles, etc.) used in manufacturing processes;

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High vacuum chemical vapour deposition of oxides:

Cited by 36 publications

References 48 publications

Low Temperature Epitaxial Barium Titanate Thin Film Growth in High Vacuum CVD

Low Temperature Epitaxial Barium Titanate Thin Film Growth in High Vacuum CVD

Conformal coating of amorphous silicon and germanium by high pressure chemical vapor deposition for photovoltaic fabrics

The methodologies and strategies for the development of novel material systems and coatings for applications in extreme environments − a critical review

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