2008 European Microwave Integrated Circuit Conference 2008
DOI: 10.1109/emicc.2008.4772219
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High Voltage RF LDMOS Technology for Broadcast Applications

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Cited by 10 publications
(8 citation statements)
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“…A difference with standard CMOS is that an LDMOS transistor has a drain extension region to support the breakdown voltage. The 30-[1]- [4] and 50-V [10], [11] technology have a typical breakdown voltage of 70 and 120 V, respectively, which requires a drain extension length of 3 and 6 m. The epi thickness is about equal to the drain extension length. The LDMOS n source region is connected to the backside via a metal bridge, a p sinker, and a highly conducting p substrate.…”
Section: Ldmos Device Technologymentioning
confidence: 99%
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“…A difference with standard CMOS is that an LDMOS transistor has a drain extension region to support the breakdown voltage. The 30-[1]- [4] and 50-V [10], [11] technology have a typical breakdown voltage of 70 and 120 V, respectively, which requires a drain extension length of 3 and 6 m. The epi thickness is about equal to the drain extension length. The LDMOS n source region is connected to the backside via a metal bridge, a p sinker, and a highly conducting p substrate.…”
Section: Ldmos Device Technologymentioning
confidence: 99%
“…The shields are laid out in a staircase design above the drain extension region. This staircase shield construction reduces the electric field peaks at the gate side of the drain extension, resulting in an almost ideal constant lateral field distribution [10].…”
Section: Ldmos Device Technologymentioning
confidence: 99%
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